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公开(公告)号:US20240321911A1
公开(公告)日:2024-09-26
申请号:US18537644
申请日:2023-12-12
Applicant: Samsung Electronics Co., Ltd.
Inventor: Minkwan KIM , Joonhyuk HWANG , Jonghyun GO , Changkyu LEE
IPC: H01L27/146
CPC classification number: H01L27/1462 , H01L27/14621 , H01L27/1463 , H01L27/14636 , H01L27/14645 , H01L27/14685
Abstract: An image sensor having a structure in which a light-blocking film having an excellent light-blocking effect is provided in a light-blocking region includes a first substrate including a first surface and a second surface, the first surface including a plurality of transistors, and the second surface being opposite to the first surface and configured to receive light, the first substrate comprising a pixel array region and a light-blocking region, an anti-reflection structure on the second surface of the first substrate in the pixel array region and the light-blocking region, and a light-blocking structure on the anti-reflection structure in the light-blocking region, wherein the light-blocking structure comprises a plurality of film that are sequentially stacked, the plurality of film including at least a first conductive film, a first insulating film, and a second conductive film.
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公开(公告)号:US20250031476A1
公开(公告)日:2025-01-23
申请号:US18669876
申请日:2024-05-21
Applicant: Samsung Electronics Co., Ltd.
Inventor: Minho JANG , Jonghyun GO , Doowon KWON , Changkyu LEE , Yongkun JO
IPC: H01L27/146 , H01L23/00 , H01L23/522 , H04N25/79
Abstract: An image sensor includes a first semiconductor chip including a first semiconductor substrate including a plurality of pixels and a first wiring structure having a first bonding pad; a second semiconductor chip including a second semiconductor substrate having pixel signal generator circuits, a second wiring structure on the second semiconductor substrate and having an upper bonding pad bonded to the first bonding pad, a back side insulating layer on a lower surface of the second semiconductor substrate and including a shielding metal pattern buried therein, and a conductive through-via penetrating the back side insulating layer and the first semiconductor substrate, and a third semiconductor chip including a bonding layer having a lower bonding pad connected to the conductive through via, a third semiconductor substrate including logic devices, and a third wiring structure having a third bonding pad bonded to the lower bonding pad.
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