公开(公告)号：US20240036460A1

公开(公告)日：2024-02-01

申请号：US18186994

申请日：2023-03-21

Applicant: Samsung Electronics Co., Ltd.

Inventor： MUN JA KIM ,  Seung Hyun Lee ,  Jae Sun Jung ,  Byungchul Yoo ,  Byunghoon Lee ,  Changyoung Jeong ,  Deok Hyun Kim ,  Deok Hyun Cho

IPC: G03F1/62

CPC classification number: G03F1/62

Abstract: Provided herein are protective membranes for lithography that include a core layer including carbon, an interface layer on the core layer, and a protective layer on the interface layer. The interface layer includes a reactive group bonded to a carbon atom of the core layer and the reactive group includes oxygen or nitrogen. The protective layer includes an element “M”, and the element “M” is bonded to the oxygen or nitrogen of the reactive group.