公开(公告)号：US20210286258A1

公开(公告)日：2021-09-16

申请号：US17014561

申请日：2020-09-08

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： MUN JA KIM ,  CHANGYOUNG JEONG

IPC: G03F1/66 ,  G03F1/62 ,  G03F7/20

Abstract: A pellicle transfer apparatus includes; a base including supporting a target plate, a pellicle and a flexible plate sequentially stacked on the base, and a roller unit laterally movable in a first direction across the base and including a lower roller extending in a second direction intersecting the first direction, and an upper roller above the lower roller and extending in the second direction, wherein the lower roller compresses the flexible plate while the roller unit laterally moves in the first direction across the base to bond the pellicle to the target plate, as the pellicle is separated from the flexible plate, and the flexible plate moves upward to wrap around the lower roller, and the upper roller contacts the flexible plate as it wraps around the lower roller.

公开(公告)号：US20160355001A1

公开(公告)日：2016-12-08

申请号：US15014054

申请日：2016-02-03

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： MUN JA KIM ,  Byung-Gook KIM ,  HWAN CHUL JEON ,  Ji-Beom YOO ,  Dong-Wook SHIN ,  Taesung KIM ,  Sooyoung KIM

IPC: B32B37/00 ,  B32B37/14

CPC classification number: B32B37/025 ,  B32B37/0038 ,  B32B37/12 ,  B32B37/14 ,  B32B38/10 ,  B32B2038/166 ,  B32B2305/026 ,  B32B2457/08 ,  G03F1/62 ,  H01L21/00

Abstract: A method of manufacturing a pellicle assembly, the method including attaching a carbon-containing thin film onto a transfer membrane in a wet atmosphere; attaching the carbon-containing thin film to a pellicle frame in a dry atmosphere while the carbon-containing thin film is attached onto the transfer membrane; and separating the transfer membrane from the carbon-containing thin film while the carbon-containing thin film is attached to the pellicle frame.

Abstract translation: 一种制造防护薄膜组件的方法，所述方法包括在湿气氛中将含碳薄膜附着在转移膜上; 在含碳薄膜附着在转印膜上的同时，将干燥气氛中的含碳薄膜附着在防尘薄膜组件框架上; 并且在含碳薄膜附着到防护薄膜框架上的同时将转移膜与含碳薄膜分离。

公开(公告)号：US20220167492A1

公开(公告)日：2022-05-26

申请号：US17468644

申请日：2021-09-07

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： JIHOON NA ,  MUN JA KIM ,  JAEWHAN SUNG ,  BYUNGCHUL YOO ,  JIBEOM YOO ,  HAKSEOK LEE ,  MYEONGJIN JEONG ,  HYUNJUNE CHO

IPC: H05G2/00 ,  G02B5/08 ,  G02B5/20 ,  G03F7/20

Abstract: An apparatus for generating extreme ultraviolet (EUV) light includes a raw material supply unit supplying a plasma source for generating EUV light. An EUV light source unit uses a laser to generate plasma from the plasma source. A filter is configured to extract EUV light from the light. A first protective layer is disposed on a front surface of the filter. A frame having a first region exposing at least a portion of the filter or the first protective layer is disposed on the first protective layer. A width of the first region is smaller than a width of the first protective layer and smaller than or equal to a width of the filter.

公开(公告)号：US20240036460A1

公开(公告)日：2024-02-01

申请号：US18186994

申请日：2023-03-21

Applicant: Samsung Electronics Co., Ltd.

Inventor： MUN JA KIM ,  Seung Hyun Lee ,  Jae Sun Jung ,  Byungchul Yoo ,  Byunghoon Lee ,  Changyoung Jeong ,  Deok Hyun Kim ,  Deok Hyun Cho

IPC: G03F1/62

CPC classification number: G03F1/62

Abstract: Provided herein are protective membranes for lithography that include a core layer including carbon, an interface layer on the core layer, and a protective layer on the interface layer. The interface layer includes a reactive group bonded to a carbon atom of the core layer and the reactive group includes oxygen or nitrogen. The protective layer includes an element “M”, and the element “M” is bonded to the oxygen or nitrogen of the reactive group.

公开(公告)号：US20230273515A1

公开(公告)日：2023-08-31

申请号：US17933769

申请日：2022-09-20

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： MUN JA KIM ,  JI BEOM YOO ,  KI BONG NAM ,  JIN HO YEO ,  CHANGYOUNG JEONG ,  QICHENG HU

IPC: G03F1/62 ,  G03F7/20

CPC classification number: G03F1/62 ,  G03F7/70983

Abstract: A method of fabricating a pellicle structure includes forming a metal layer on a temporary substrate, forming a membrane on the metal layer, exposing a bottom surface of the metal layer by separating the temporary substrate from the metal layer, and exposing a bottom surface of the membrane by etching the exposed bottom surface of the metal layer.