REFLECTION APPARATUS AND BEAM PROJECTOR HAVING THE SAME
    1.
    发明申请
    REFLECTION APPARATUS AND BEAM PROJECTOR HAVING THE SAME 审中-公开
    反射装置和具有它的光束投影机

    公开(公告)号:US20130083301A1

    公开(公告)日:2013-04-04

    申请号:US13628577

    申请日:2012-09-27

    CPC classification number: G03B21/28

    Abstract: A reflection apparatus for a beam projector, and a beam projector including the reflection apparatus are provided. The reflection apparatus reflects and projects incident light from a projection optical system of the beam projector to an external surface, and includes a first mirror for reflecting the incident light from the projection optical system, and a second mirror that receives the light reflected from the first mirror and reflects the received light to the external surface.

    Abstract translation: 提供了一种用于射束投影仪的反射装置和包括该反射装置的射束投影仪。 反射装置将入射光从射线投影仪的投影光学系统反射并投影到外表面,并且包括用于反射来自投影光学系统的入射光的第一反射镜和接收从第一 反射并将接收到的光反射到外表面。

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