公开(公告)号：US20240321599A1

公开(公告)日：2024-09-26

申请号：US18418827

申请日：2024-01-22

Applicant: Samsung Electronics Co., Ltd.

Inventor： Hoyoung RYU ,  SEUNGKWAN HONG ,  JAEWON LEE ,  Daeok KIM ,  YEOJIN SHIN ,  Dongchan CHOI

IPC: H01L21/67 ,  B01J35/39 ,  H01L21/02

CPC classification number: H01L21/67051 ,  B01J35/39 ,  H01L21/02052 ,  H01L21/67115

Abstract: Disclosed are semiconductor fabrication systems, chemical supply apparatuses, and substrate processing methods. The semiconductor fabrication system comprises a substrate processing apparatus and a chemical supply apparatus that supplies the substrate processing apparatus with a chemical. The chemical supply apparatus includes a main tank, a supply line that connects the main tank to an inlet of the substrate processing apparatus, a recycle tank connected to an outlet of the substrate processing apparatus, and a recycle filtering device between the recycle tank and the main tank. The recycle filtering device includes a photocatalytic reactor, a nanofilter between the photocatalytic reactor and the main tank, and a connection line that connects the photocatalytic reactor to the nanofilter.