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公开(公告)号:US20200088649A1
公开(公告)日:2020-03-19
申请号:US16364251
申请日:2019-03-26
Applicant: Samsung Electronics Co., Ltd.
Inventor: Eun-Hee JEANG , Aleksandr SHOROKHOV , Anton MEDVEDEV , Maksim RIABKO , Sang-Woo BAE , Akinori OKUBO , Sang-Min LEE , Seong-Keun CHO , Won-Don JOO
Abstract: In a method of detecting a defect on a substrate, an incident beam may be radiated to a surface of the substrate to generate reflected light beams. A second harmonic generation (SHG) beam among the reflected light beams may be detected. The SHG beam may be generated by a defect on the substrate. A nano size defect may be detected by examining the SHG beam.