公开(公告)号：US20200083030A1

公开(公告)日：2020-03-12

申请号：US16366225

申请日：2019-03-27

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Hun-Yong PARK ,  Sang-Woo BAE ,  Seul-Gi LEE ,  Won-Don JOO

IPC: H01J37/32 ,  G01N21/68 ,  G01N21/47

Abstract: A plasma monitoring system includes a plasma chamber performing plasma processes, first and second plasma sensing devices, and a controller. The first and second plasma sensing devices are respectively in a first horizontal direction and a second horizontal direction perpendicular to each other from a center point of a monitoring plasma plane in the plasma chamber. The first and second plasma sensing device generate first and second detection signals with respect to the monitoring plasma plane based on a first incident beam radiated from the monitoring plasma plane in the first horizontal direction and a second incident beam radiated from the monitoring plasma plane in the second horizontal direction. The controller detects two-dimensional plasma distribution information with respect to the monitoring plasma plane by performing a convolution operation based on the first and second detection signals, and controls the plasma processes based on the two-dimensional plasma distribution information.

公开(公告)号：US20200088649A1

公开(公告)日：2020-03-19

申请号：US16364251

申请日：2019-03-26

Applicant: Samsung Electronics Co., Ltd.

Inventor： Eun-Hee JEANG ,  Aleksandr SHOROKHOV ,  Anton MEDVEDEV ,  Maksim RIABKO ,  Sang-Woo BAE ,  Akinori OKUBO ,  Sang-Min LEE ,  Seong-Keun CHO ,  Won-Don JOO

IPC: G01N21/88 ,  G01N21/21

Abstract: In a method of detecting a defect on a substrate, an incident beam may be radiated to a surface of the substrate to generate reflected light beams. A second harmonic generation (SHG) beam among the reflected light beams may be detected. The SHG beam may be generated by a defect on the substrate. A nano size defect may be detected by examining the SHG beam.