公开(公告)号：US20160131472A1

公开(公告)日：2016-05-12

申请号：US14850425

申请日：2015-09-10

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Alexey SHCHEKIN ,  Maksim RIABKO ,  Sergey KOPTYAEV ,  Anton MEDVEDEV

IPC: G01B11/00 ,  G01B9/02

CPC classification number: G01M11/005 ,  G01B2210/56 ,  G01M11/0271 ,  G01N21/9501 ,  G03F7/70625

Abstract: Provided is an optical measurement system. The optical measurement system includes: an optical module which includes an optical system and which is configured to illuminate a sample and register a defocused image of a nanostructured surface of the sample, an optical system parameter control module configured to set optical parameters of the optical system, an optical transfer function (OTF) measurement module configured to measure an OTF, a defocused image calculation module configured to calculate the defocused image based on the measured OTF and the optical parameters, and a critical dimension (CD) evaluation module configured to compare the registered defocused image with the calculated defocused image of the nanostructured surface of the sample and to output a CD value of the nanostructured surface.

Abstract translation: 提供了一种光学测量系统。 光学测量系统包括：光学模块，其包括光学系统，其被配置为照亮样本并对样​​品的纳米结构表面的散焦图像进行注册;光学系统参数控制模块，被配置为设置光学系统的光学参数 配置为测量OTF的光学传递函数（OTF）测量模块，被配置为基于所测量的OTF和光学参数来计算散焦图像的散焦图像计算模块，以及临时尺寸（CD）评估模块， 使用所计算的样品的纳米结构表面的散焦图像记录散焦图像并输出纳米结构表面的CD值。

公开(公告)号：US20220120662A1

公开(公告)日：2022-04-21

申请号：US17215185

申请日：2021-03-29

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Sangwoo BAE ,  Boris AFINOGENOV ,  Maksim RIABKO ,  Anton MEDVEDEV ,  Aleksandr SHOROKHOV ,  Anton SOFRONOV ,  Ingi KIM ,  Jungwook KIM ,  Youngjoo LEE ,  Kyunghun HAN

IPC: G01N15/14

Abstract: A particle inspection method includes irradiating a spatially modulated modulation beam onto a surface of a substrate and detecting an absorption light signal from a reflection beam generated through reflection of the spatially modulated modulation beam by the substrate.

公开(公告)号：US20200088649A1

公开(公告)日：2020-03-19

申请号：US16364251

申请日：2019-03-26

Applicant: Samsung Electronics Co., Ltd.

Inventor： Eun-Hee JEANG ,  Aleksandr SHOROKHOV ,  Anton MEDVEDEV ,  Maksim RIABKO ,  Sang-Woo BAE ,  Akinori OKUBO ,  Sang-Min LEE ,  Seong-Keun CHO ,  Won-Don JOO

IPC: G01N21/88 ,  G01N21/21

Abstract: In a method of detecting a defect on a substrate, an incident beam may be radiated to a surface of the substrate to generate reflected light beams. A second harmonic generation (SHG) beam among the reflected light beams may be detected. The SHG beam may be generated by a defect on the substrate. A nano size defect may be detected by examining the SHG beam.