公开(公告)号：US20230187235A1

公开(公告)日：2023-06-15

申请号：US18073980

申请日：2022-12-02

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Akinori OKUBO ,  Youngchul KWON ,  Sungho JANG ,  Jungchul LEE ,  Deoksuk JANG

IPC: H01L21/67 ,  G02B27/09 ,  G02B27/00 ,  B23K26/53

CPC classification number: H01L21/67092 ,  G02B27/0927 ,  G02B27/0081 ,  B23K26/53 ,  G02B19/0047

Abstract: A stealth dicing laser device including: a pulse laser generator configured to generate laser light; a condenser lens formed in an optical path of the laser light; a pupil filter configured to transform a phase of the laser light before the laser light passes through the condenser lens; and a controller configured to provide a phase control signal to the pupil filter, wherein the pupil filter transforms the phase of the laser light based on the phase control signal, wherein the phase control signal is a signal transforming a phase expression of the laser light based on a parameter.

公开(公告)号：US20230102791A1

公开(公告)日：2023-03-30

申请号：US17740494

申请日：2022-05-10

Applicant: Samsung Electronics Co., Ltd.

Inventor： Sung Ho JANG ,  Min Hwan SEO ,  Jang Hwi LEE ,  Young Chul KWON ,  Sang Woo BAE ,  Akinori OKUBO ,  Jung Chul LEE ,  Won Don JOO

IPC: B23K26/53 ,  B23K26/38 ,  B23K26/03

Abstract: A method for dicing a substrate includes setting a target height for forming a first reforming region inside a target substrate, the target height being a distance from an upper surface of the target substrate to the first reforming region; irradiating a laser beam to a first sample substrate including a first film and a second film being in contact with the first film, and setting a target condition on the basis of a sample condition that results in forming a condensing point of the laser beam on an upper surface of the first film being in contact with the second film; and irradiating the target substrate with the laser beam according to the target condition to form the first reforming region inside the target substrate, wherein a thickness of the second film is the target height.

公开(公告)号：US20230068376A1

公开(公告)日：2023-03-02

申请号：US17740529

申请日：2022-05-10

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Ingi KIM ,  Minhwan SEO ,  Sangwoo BAE ,  Akinori OKUBO ,  Jungchul LEE ,  Eunhee JEANG

IPC: G01J4/02

Abstract: Provided is a polarization measuring device including a stage on which a measurement target is provided, a light source assembly configured to emit incident light, a first polarimeter configured to polarize the incident light, a second polarimeter configured to polarize reflected light reflected from the measurement target that is irradiated by the incident light, a filter assembly configured to remove noise from the reflected light, and a detector configured to receive the reflected light and measure an intensity of the reflected light and a phase of the reflected light.

公开(公告)号：US20200088649A1

公开(公告)日：2020-03-19

申请号：US16364251

申请日：2019-03-26

Applicant: Samsung Electronics Co., Ltd.

Inventor： Eun-Hee JEANG ,  Aleksandr SHOROKHOV ,  Anton MEDVEDEV ,  Maksim RIABKO ,  Sang-Woo BAE ,  Akinori OKUBO ,  Sang-Min LEE ,  Seong-Keun CHO ,  Won-Don JOO

IPC: G01N21/88 ,  G01N21/21

Abstract: In a method of detecting a defect on a substrate, an incident beam may be radiated to a surface of the substrate to generate reflected light beams. A second harmonic generation (SHG) beam among the reflected light beams may be detected. The SHG beam may be generated by a defect on the substrate. A nano size defect may be detected by examining the SHG beam.

公开(公告)号：US20190113463A1

公开(公告)日：2019-04-18

申请号：US15940011

申请日：2018-03-29

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Seongkeun CHO ,  Akinori OKUBO ,  Tae Hyun KIM ,  Sangwoo BAE ,  Janghwi LEE

IPC: G01N21/88 ,  G01N21/21 ,  G01N21/95 ,  H01L21/66 ,  H01L21/67

CPC classification number: G01N21/8806 ,  G01N21/21 ,  G01N21/9501 ,  G01N2021/8848 ,  G01N2201/0683 ,  H01L21/67288 ,  H01L22/12

Abstract: An optical test system includes a stage region to accommodate an object to be tested, a first incident optical system which changes a first polarization state of a first light beam to a second polarization state and provide the first light beam in the second polarization state to the stage region in a first direction at a first incident angle which is not a right angle, a second incident optical system which changes a third polarization state of a second light beam to a fourth polarization state and inputs the second light beam in the fourth polarization state to the stage region in a second direction at a second incident angle which is not a right angle, and a main optical system to detect a first reflected light beam reflected from the stage region at a first reflection angle different from the first and second incident.