公开(公告)号：US20210092825A1

公开(公告)日：2021-03-25

申请号：US16861595

申请日：2020-04-29

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： In Ho CHOI ,  Min Seok Choi ,  Jeong-Gil Kim ,  Hyuck Shin ,  In Jae Lee ,  Sung Ho Jang

IPC: H05G2/00

Abstract: An extreme ultraviolet generation apparatus is provided. The extreme ultraviolet generation apparatus includes a chamber, a droplet generator configured to provide a droplet into the chamber, a shroud which extends along a movement path of the droplet inside the chamber and surrounds the movement path of the droplet, a charging unit configured to charge the droplet, a monitoring unit configured to measure a position of the charged droplet, an alignment unit including at least one electromagnet, the alignment unit configured to correct the position of the charged droplet within the shroud using the at least one electromagnet, and an acceleration unit configured to accelerate the charged droplet after the position of the charged droplet has been corrected.

公开(公告)号：US11217495B2

公开(公告)日：2022-01-04

申请号：US17008627

申请日：2020-08-31

Applicant: Samsung Electronics Co., Ltd.

Inventor： Sang-Young Kim ,  Kyung-Soo Rho ,  Ho-Jeong Moon ,  Hyuck Shin ,  Sun-Nyeong Jung

IPC: H01L21/66 ,  G21K1/10 ,  G01N23/04 ,  H01L23/31 ,  H01L23/00 ,  H01L25/065

Abstract: An X-ray source is disposed and a detector is disposed adjacent to the X-ray source. A test specimen holder is disposed between the X-ray source and the detector. A filter is disposed between the X-ray source and the test specimen holder. The filter has a plate-shaped semiconductor, a granular semiconductor, or a combination thereof.

公开(公告)号：US20210132515A1

公开(公告)日：2021-05-06

申请号：US16880090

申请日：2020-05-21

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Sungho JANG ,  Sungyeol Kim ,  Hyuck Shin ,  Keunhee Bai ,  Injae Lee

IPC: G03F7/20

Abstract: An extreme ultraviolet exposure system includes an exposure chamber having an internal space, upper and lower electrostatic chucks, a power supply, a light source, and a mask.
The upper electrostatic chuck includes first and second electrodes that are adjacent to one another and that generate an electric field of different polarities, respectively, to provide an electrostatic force.
The mask is attachable to the lower surface of the upper electrostatic chuck by the electrostatic force. The mask has a metal thin film pattern including a first region in which a metal thin film that shields the electric field, and a second region in which the metal thin film is not disposed and through which the electric field is transmitted.
When the mask is attached, the electric field transmitted through the second region applies an attractive force or a repulsive force to charged particles in the exposure chamber.

公开(公告)号：US11490499B2

公开(公告)日：2022-11-01

申请号：US17242022

申请日：2021-04-27

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Sungho Jang ,  Yoonjae Kim ,  Hyuck Shin ,  Donghyub Lee ,  Kul Inn

IPC: H05G2/00 ,  G03F7/20 ,  H01S3/223

Abstract: A method of manufacturing a semiconductor includes generating plasma in an amplifying tube using gas as a gain medium; detecting a state of the plasma generated in the amplifying tube; determining a virtual laser gain based on the detected state of the plasma; controlling the state of the plasma such that the virtual laser gain is within a target range; and manufacturing the semiconductor device including performing an exposure process on a substrate using a laser beam output from the amplifying tube adjusted to have the virtual laser gain within the target range.

公开(公告)号：US11109474B2

公开(公告)日：2021-08-31

申请号：US16861595

申请日：2020-04-29

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： In Ho Choi ,  Min Seok Choi ,  Jeong-Gil Kim ,  Hyuck Shin ,  In Jae Lee ,  Sung Ho Jang

IPC: H05G2/00

Abstract: An extreme ultraviolet generation apparatus is provided. The extreme ultraviolet generation apparatus includes a chamber, a droplet generator configured to provide a droplet into the chamber, a shroud which extends along a movement path of the droplet inside the chamber and surrounds the movement path of the droplet, a charging unit configured to charge the droplet, a monitoring unit configured to measure a position of the charged droplet, an alignment unit including at least one electromagnet, the alignment unit configured to correct the position of the charged droplet within the shroud using the at least one electromagnet, and an acceleration unit configured to accelerate the charged droplet after the position of the charged droplet has been corrected.

公开(公告)号：US11016400B1

公开(公告)日：2021-05-25

申请号：US16880090

申请日：2020-05-21

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Sungho Jang ,  Sungyeol Kim ,  Hyuck Shin ,  Keunhee Bai ,  Injae Lee

IPC: G03F7/20

Abstract: An extreme ultraviolet exposure system includes an exposure chamber having an internal space, upper and lower electrostatic chucks, a power supply, a light source, and a mask. The upper electrostatic chuck includes first and second electrodes that are adjacent to one another and that generate an electric field of different polarities, respectively, to provide an electrostatic force. The mask is attachable to the lower surface of the upper electrostatic chuck by the electrostatic force. The mask has a metal thin film pattern including a first region in which a metal thin film that shields the electric field, and a second region in which the metal thin film is not disposed and through which the electric field is transmitted. When the mask is attached, the electric field transmitted through the second region applies an attractive force or a repulsive force to charged particles in the exposure chamber.