公开(公告)号：US20130251238A1

公开(公告)日：2013-09-26

申请号：US13671685

申请日：2012-11-08

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Hak-Seung HAN ,  Jin-Back PARK ,  In-Kyun SHIN

IPC: G06T7/00

CPC classification number: G06T7/001 ,  G06T7/337 ,  G06T2207/20224 ,  G06T2207/30148

Abstract: A method of aligning an object may include obtaining a first actual image of a first pattern on the object, setting the first actual image as a first reference image, obtaining a second actual image of a second pattern on the object, comparing the second actual image with the first reference image to obtain first relative position difference values of the second actual image with respect to the first reference image, and converting the first relative position difference values into first absolute position difference values with respect to a reference point on the object.

Abstract translation: 对准对象的方法可以包括获得对象上的第一图案的第一实际图像，将第一实际图像设置为第一参考图像，获得对象上的第二图案的第二实际图像，比较第二实际图像 利用第一参考图像获得第二实际图像相对于第一参考图像的第一相对位置差值，并且将第一相对位置差值相对于对象上的参考点转换为第一绝对位置差值。

公开(公告)号：US20150311032A1

公开(公告)日：2015-10-29

申请号：US14632767

申请日：2015-02-26

Applicant: Samsung Electronics Co., Ltd.

Inventor： Yong-Seok JUNG ,  Shuichi TAMAMUSHI ,  In-Hwan NOH ,  In-Kyun SHIN ,  Sang-Hee LEE ,  Jin CHOI

IPC: H01J37/147 ,  H01J37/30 ,  H01J37/317

CPC classification number: H01J37/1472 ,  H01J37/3005 ,  H01J37/3174 ,  H01J2237/063 ,  H01J2237/15

Abstract: An exposure method may include: radiating a charged particle beam in an exposure system comprising a beam generator, radiating the beam, and main and auxiliary deflectors deflecting the beam to determine a position of a beam shot; determining whether a deflection distance from a first position of a latest radiated beam shot to a second position of a subsequent beam shot is within a first distance in a main field area of an exposure target area, the main field area having a size determined by the main deflector; setting a settling time according to the deflection distance so that a settling time of the subsequent beam shot is set to a constant minimum value, greater than zero, when the deflection distance from the first position to the second position is within the first distance; and deflecting the beam using the main deflector based on the set settling time.

Abstract translation: 曝光方法可以包括：在包括光束发生器，辐射光束以及偏转光束的主和辅助偏转器的曝光系统中辐射带电粒子束以确定射束的位置; 确定从最近发射光束的第一位置到随后的射束射击的第二位置的偏转距离是否在曝光目标区域的主场区域内的第一距离内，所述主场区域具有由 主导流板 根据所述偏转距离设定建立时间，使得当从所述第一位置到所述第二位置的偏转距离在所述第一距离内时，所述后续射束的建立时间被设定为大于零的恒定最小值; 并且基于设定的建立时间使用主偏转器偏转光束。