公开(公告)号：US12040154B2

公开(公告)日：2024-07-16

申请号：US17740854

申请日：2022-05-10

Applicant: Applied Materials, Inc.

Inventor： Graham Wright ,  Shardul S. Patel

IPC: H01J37/32 ,  H01J37/08

CPC classification number: H01J37/08 ,  H01J37/3244 ,  H01J2237/063

Abstract: An ion source that is capable of different modes of operation is disclosed. A solid target may be disposed in the arc chamber. The ion source may have several gas inlets, in communication with different gasses. When operating in a first mode, the ion source may supply a first gas, such as a halogen containing gas. When operating in a second mode, the ion source may supply an organoaluminium gas. Ions having single charges may be created in the first mode, while ions having multiple charges may be created in the second mode. In some embodiments, the solid target may be retractable.

公开(公告)号：US11754388B2

公开(公告)日：2023-09-12

申请号：US17140302

申请日：2021-01-04

Applicant: JEOL Ltd.

Inventor： Yukinori Aida

IPC: H01J37/20 ,  H01J37/30 ,  H01J37/317 ,  G01B11/06

CPC classification number: G01B11/0608 ,  H01J37/20 ,  H01J37/3007 ,  H01J37/3174 ,  H01J2237/032 ,  H01J2237/063 ,  H01J2237/10 ,  H01J2237/15 ,  H01J2237/202

Abstract: A height measuring device includes a light source that emits light in a direction oblique to a top surface of a specimen, a slit that shapes the light from the light source to form a slit image on the specimen, an imaging element that detects reflected light reflected by the specimen, and an arithmetic unit. The arithmetic unit: identifies a slit image of the reflected light reflected by the top surface of the specimen from among a plurality of slit images based on respective positions of the plurality of slit images on a detection surface of the imaging element; and determines the height of the top surface of the specimen based on the position of the slit image of the reflected light reflected by the top surface of the specimen on the detection surface.

公开(公告)号：US20230230814A1

公开(公告)日：2023-07-20

申请号：US18189519

申请日：2023-03-24

Applicant: Tokyo Electron Limited

Inventor： Peter Ventzek ,  Alok Ranjan

IPC: H01J37/32 ,  H01L21/263

CPC classification number: H01J37/32541 ,  H01L21/263 ,  H01J37/32715 ,  H01J37/32082 ,  H01J37/32348 ,  H01J37/3255 ,  H01J2237/063

Abstract: A method of processing includes directing an electron beam comprising ballistic electrons from an electron source towards a peripheral region of a substrate to be processed. The peripheral region surrounds a central region of the substrate. The electron beam may be directed such that the ballistic electrons impinge on the peripheral region and not on the central region of the substrate. The ballistic electrons may stimulate chemical reactions on the substrate. The method may include placing the substrate on a substrate holder disposed within a vacuum chamber. The method may also include generating the electron beam from a plasma in the vacuum chamber. The method may further include processing the substrate with ions from the plasma.

公开(公告)号：US11688586B2

公开(公告)日：2023-06-27

申请号：US16221918

申请日：2018-12-17

Applicant: Tokyo Electron Limited

Inventor： Peter Ventzek ,  Alok Ranjan

IPC: H01L21/00 ,  H01J37/32 ,  H01L21/263

CPC classification number: H01J37/32541 ,  H01J37/3255 ,  H01J37/32082 ,  H01J37/32348 ,  H01J37/32715 ,  H01L21/263 ,  H01J2237/063

Abstract: In an embodiment, a plasma processing system includes a vacuum chamber, a substrate holder configured to hold a substrate to be processed where the substrate holder is disposed in the vacuum chamber. The system further includes an electron source disposed above a peripheral region of the substrate holder, the electron source being configured to generate an electron beam towards the peripheral region of the substrate holder.

公开(公告)号：US20180343734A1

公开(公告)日：2018-11-29

申请号：US15865056

申请日：2018-01-08

Applicant: Cornell University

Inventor： Amit Lal ,  Yue Shi ,  Serhan Ardanuc ,  June-Ho Hwang ,  Farhan Rana

IPC: H05H9/04 ,  H05H7/04 ,  H01J37/147 ,  H01J37/06

CPC classification number: H05H9/045 ,  H01J37/06 ,  H01J37/1472 ,  H01J2237/063 ,  H01J2237/15 ,  H05H7/04 ,  H05H9/042 ,  H05H2007/043 ,  H05H2007/046

Abstract: A system that generates short charged particle packets or pulses (e.g., electron packets) without requiring a fast-switching-laser source is described. This system may include a charged particle source that produces a stream of continuous charged particles to propagate along a charged particle path. The system also includes a charged particle deflector positioned in the charged particle path to deflect the stream of continuous charged particles to a set of directions different from the charged particle path. The system additionally includes a series of beam blockers located downstream from the charged particle deflector and spaced from one another in a linear configuration as a beam-blocker grating. This beam-blocker grating can interact with the deflected stream of charged particles and divide the stream of the charged particles into a set of short particle packets. In one embodiment, the charged particles are electrons. The beam blockers can be conductors.

公开(公告)号：US20180275079A1

公开(公告)日：2018-09-27

申请号：US15928807

申请日：2018-03-22

Applicant: Hitachi High-Tech Science Corporation

Inventor： Keiichi Tanaka ,  Kazuo Chinone

IPC: G01N23/2252 ,  H01J37/285 ,  H01J37/244

CPC classification number: G01N23/2252 ,  G01N2223/079 ,  H01J37/244 ,  H01J37/285 ,  H01J2237/063 ,  H01J2237/24507

Abstract: The radiation analyzing apparatus irradiates an object including a plurality of elements with a first radiation, detects a plurality of rays of a second radiation emitted from the object irradiated with the first radiation, derives an energy spectrum based on a signal of each of the plurality of rays of the second radiation, detects detection energy, which is energy absorbed in a reference element that is an element used as a reference or is energy emitted from the reference element, based on the energy spectrum, and corrects the energy spectrum based on reference energy information, which is previously stored in a storage unit and indicates reference energy that is energy absorbed in the reference element or is energy emitted from the reference element, and the detection energy.

公开(公告)号：US10074506B2

公开(公告)日：2018-09-11

申请号：US14434824

申请日：2012-10-12

Applicant: Hitachi High-Techonologies Corporation

Inventor： Takashi Ichimura ,  Hisao Nitta ,  Nobuyuki Sonobe ,  Boklae Cho ,  Hisaya Murakoshi

IPC: H01J37/065 ,  H01J1/16 ,  H01J1/30 ,  H01J9/02 ,  H01J9/04 ,  C25F3/26 ,  H01J1/304 ,  H01J37/073 ,  H01J37/06 ,  H01J37/285

CPC classification number: H01J37/065 ,  C25F3/26 ,  H01J1/16 ,  H01J1/3044 ,  H01J9/025 ,  H01J9/042 ,  H01J37/06 ,  H01J37/073 ,  H01J37/285 ,  H01J2237/063 ,  H01J2237/06316 ,  H01J2237/06341

Abstract: A conventional method to process a tip fails to designate the dimension of the shape of the end of the tip, and so fails to obtain a tip having any desired diameter. Impurities may be attached to the tip. Based on a correlation between the voltage applied or the time during processing of the end of the tip and the diameter of the tip end, the applied voltage is controlled so as to obtain a desired diameter of the tip end for processing of the tip. This allows a sharpened tip made of a tungsten monocrystal thin wire to be manufactured to have any desired diameter in the range of 0.1 μm or more and 2.0 μm or less.

公开(公告)号：US09799484B2

公开(公告)日：2017-10-24

申请号：US14964221

申请日：2015-12-09

Applicant: Hermes Microvision Inc.

Inventor： Shuai Li

IPC: H01J37/143 ,  H01J37/28 ,  H01J3/20 ,  H01J37/09

CPC classification number: H01J37/143 ,  H01J3/20 ,  H01J37/063 ,  H01J37/065 ,  H01J37/09 ,  H01J37/14 ,  H01J37/28 ,  H01J2237/0453 ,  H01J2237/063 ,  H01J2237/06308 ,  H01J2237/06375 ,  H01J2237/0653 ,  H01J2237/083 ,  H01J2237/141 ,  H01J2237/1415 ,  H01J2237/2806 ,  H01J2237/2817

Abstract: This invention provides a charged particle source, which comprises an emitter and means of generating a magnetic field distribution. The magnetic field distribution is minimum, about zero, or preferred zero at the tip of the emitter, and along the optical axis is maximum away from the tip immediately. In a preferred embodiment, the magnetic field distribution is provided by dual magnetic lens which provides an anti-symmetric magnetic field at the tip, such that magnetic field at the tip is zero.

公开(公告)号：US09754760B2

公开(公告)日：2017-09-05

申请号：US15404694

申请日：2017-01-12

Applicant: Hermes Microvision Inc.

Inventor： Shuai Li

IPC: H01J37/143 ,  H01J37/28 ,  H01J37/09

CPC classification number: H01J37/143 ,  H01J3/20 ,  H01J37/063 ,  H01J37/065 ,  H01J37/09 ,  H01J37/14 ,  H01J37/28 ,  H01J2237/0453 ,  H01J2237/063 ,  H01J2237/06308 ,  H01J2237/06375 ,  H01J2237/0653 ,  H01J2237/083 ,  H01J2237/141 ,  H01J2237/1415 ,  H01J2237/2806 ,  H01J2237/2817

Abstract: This invention provides a charged particle source, which comprises an emitter and means of generating a magnetic field distribution. The magnetic field distribution is minimum, about zero, or preferred zero at the tip of the emitter, and along the optical axis is maximum away from the tip immediately. In a preferred embodiment, the magnetic field distribution is provided by dual magnetic lens which provides an anti-symmetric magnetic field at the tip, such that magnetic field at the tip is zero.

公开(公告)号：US20170250052A1

公开(公告)日：2017-08-31

申请号：US15595214

申请日：2017-05-15

Applicant: APPLIED MATERIALS ISRAEL LTD.

Inventor： Alex GOLDENSHTEIN

IPC: H01J37/073 ,  H01J37/28

CPC classification number: H01J37/073 ,  H01J37/026 ,  H01J37/226 ,  H01J37/28 ,  H01J2237/0047 ,  H01J2237/04 ,  H01J2237/063 ,  H01J2237/2801 ,  H01J2237/2817

Abstract: A method and a system for imaging an object, the system may include electron optics that may be configured to scan a first area of the object with at least one electron beam; wherein the electron optics may include a first electrode; and light optics that may be configured to illuminate at least one target of (a) the first electrode and (b) the object, thereby causing an emission of electrons between the first electrode and the object.