公开(公告)号：US12254621B2

公开(公告)日：2025-03-18

申请号：US17856130

申请日：2022-07-01

Applicant: Samsung Electronics Co., Ltd.

Inventor： Do-Nyun Kim ,  Min-Cheol Kang ,  Kihyun Kim ,  Jaehoon Kim ,  Jaekyung Lim

IPC: G06K9/00 ,  G01N21/95 ,  G06T7/00 ,  H01L21/66

Abstract: Disclosed is an operating method of an electronic device for manufacture of a semiconductor device. The method includes receiving, at the electronic device, a computer-aided design (CAD) image for a lithography process of the semiconductor device, and generating, at the electronic device, a first scanning electron microscope (SEM) image and a first segment (SEG) image from the CAD image by using a machine learning-based module, and the first SEG image includes information about a location of a defect.