公开(公告)号：US20200168478A1

公开(公告)日：2020-05-28

申请号：US16387779

申请日：2019-04-18

Applicant: Samsung Electronics Co., Ltd.

Inventor： Dae Sung Jung ,  Sang Yoon Soh ,  Jong Min Song ,  Min Ho Kang

IPC: H01L21/67 ,  H05F3/00

Abstract: Provided are a chemical liquid supply apparatus and a semiconductor processing apparatus. The chemical liquid supply apparatus, which supplies a chemical liquid to a process chamber during a semiconductor manufacturing process, may include a chemical liquid supply pipe in which the chemical liquid flows therein and of which a spray end, through which the chemical liquid is sprayed, extends into the process chamber, an external electrode disposed outside the chemical liquid supply pipe, and a power supply module configured to apply power to the external electrode.