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公开(公告)号:US09812372B2
公开(公告)日:2017-11-07
申请号:US15232151
申请日:2016-08-09
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor: Youn Sok Choi , Jeong Hyoun Sung , Sang Yoon Soh
IPC: H01L21/66 , H01L21/683
CPC classification number: H01L22/12 , H01L21/67103 , H01L21/67109 , H01L21/67248 , H01L21/6831 , H01L21/6833
Abstract: An electrostatic chuck assembly includes a reference temperature sensor, a measurement zone temperature sensor, and a measurement zone temperature calculator. The reference temperature sensor measures a reference temperature of the electrostatic chuck. The measurement zone temperature sensor is spaced from the reference temperature sensor on the electrostatic chuck and senses temperature signals of a plurality measurement zones of the electrostatic chuck. The measurement zone temperature calculator calculates a temperature of each of the measurement zones by setting a measurement range within a temperature range, previously determined based on the reference temperature measured by the reference temperature sensor, and measures the temperature signal of each of the measurement zones sensed by the measurement zone temperature sensor within the measurement range.
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2.
公开(公告)号:US20200168478A1
公开(公告)日:2020-05-28
申请号:US16387779
申请日:2019-04-18
Applicant: Samsung Electronics Co., Ltd.
Inventor: Dae Sung Jung , Sang Yoon Soh , Jong Min Song , Min Ho Kang
Abstract: Provided are a chemical liquid supply apparatus and a semiconductor processing apparatus. The chemical liquid supply apparatus, which supplies a chemical liquid to a process chamber during a semiconductor manufacturing process, may include a chemical liquid supply pipe in which the chemical liquid flows therein and of which a spray end, through which the chemical liquid is sprayed, extends into the process chamber, an external electrode disposed outside the chemical liquid supply pipe, and a power supply module configured to apply power to the external electrode.
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