APPARATUS FOR REMOVING RESIDUE OF EUV LIGHT SOURCE VESSEL

    公开(公告)号:US20230144163A1

    公开(公告)日:2023-05-11

    申请号:US17939293

    申请日:2022-09-07

    CPC classification number: G03F7/70925 G03F7/7085

    Abstract: An apparatus for removing a residue of an EUV light source vessel including an internal side surface having a curved surface is provided. The apparatus includes a frame portion configured to be disposed on a bottom surface of an EUV light source vessel and a head portion above the frame portion. The head portion is configured to be rotatably moved on a circular trajectory while maintaining a desired (and/or alternatively predetermined) distance from the curved surface of the EUV light source vessel. The head portion may have a heating member configured to emit heat toward the curved surface of the EUV light source vessel. The heating member may have a shape curved in an arc corresponding to a portion of the circular trajectory.

    DROPLET ACCELERATING ASSEMBLY AND EXTREME ULTRA-VIOLET LITHOGRAPHY APPARATUS INCLUDING THE SAME

    公开(公告)号:US20220174806A1

    公开(公告)日:2022-06-02

    申请号:US17393474

    申请日:2021-08-04

    Abstract: A droplet accelerating assembly includes an acceleration chamber extending in a first direction parallel to an ejection direction of the droplet, the acceleration chamber having a first side connected to the droplet generator, a second side opposite the first side in the first direction, the second side including a discharge hole, and a fluid flow path, a pressure controller connected to the fluid flow path of the acceleration chamber, the pressure controller being configured to adjust an internal pressure of the acceleration chamber, an electrifier in the acceleration chamber, the electrifier being configured to electrify the droplet ejected by the droplet generator into an electrified droplet, and an accelerator in the acceleration chamber, the accelerator being configured to accelerate the electrified droplet.

Patent Agency Ranking