公开(公告)号：US20240290570A1

公开(公告)日：2024-08-29

申请号：US18498289

申请日：2023-10-31

Applicant: Samsung Electronics Co., Ltd.

Inventor： Kyoungchul YOO

IPC: H01J37/08 ,  H01J37/317

CPC classification number: H01J37/08 ,  H01J37/3171 ,  H01J2237/0653

Abstract: A repeller may be mounted inside an arc chamber of an ion implantation apparatus for doping impurities into a surface film of a semiconductor wafer. The repeller may include a body including an outer circumferential surface and a surface area enlargement portion on the body. The surface area enlargement portion may include striped grooves continuously formed on the outer circumferential surface of the body at intervals in a longitudinal direction of the body.