公开(公告)号：US20210028035A1

公开(公告)日：2021-01-28

申请号：US16833903

申请日：2020-03-30

Applicant: Samsung Electronics Co., Ltd.

Inventor： Myungjun Lee ,  Wookrae Kim ,  Jaehwang Jung ,  Myoungki Ahn

IPC: H01L21/67 ,  G01N21/21 ,  G01N21/95 ,  H01L21/66 ,  G06T7/00

Abstract: Provided is an imaging ellipsometry (IE)-based inspection method including selecting a mode from among a first mode of an IE-based inspection device having a first field of view (FOV) and a second mode of an IE-based inspection device having a second FOV, measuring an inspection target by the IE-based inspection device based on the selected mode, and determining whether the inspection target is normal based on a result of the measuring, wherein the measuring of the inspection target comprises simultaneously measuring patterns included in a plurality of cells provided in a region of the inspection target, the region corresponding to an FOV of the selected mode.

公开(公告)号：US11624699B2

公开(公告)日：2023-04-11

申请号：US17081568

申请日：2020-10-27

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Jaehwang Jung ,  Wookrae Kim ,  Myoungki Ahn ,  Changhyeong Yoon

IPC: G01N21/21 ,  G01N21/95

Abstract: A measurement system is disclosed. A measurement system includes an illumination module, a mirror module, a stage, and a detector. The illumination module includes a light source, an optical fiber, a collimating mirror, a polarization state generator, a beam control mirror, and a relay mirror. The mirror module includes a first beam splitter and a reflective objective mirror. The beam control mirror is movable to relay light received from the polarization state generator to various positions on the relay mirror.

公开(公告)号：US11972960B2

公开(公告)日：2024-04-30

申请号：US16833903

申请日：2020-03-30

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Myungjun Lee ,  Wookrae Kim ,  Jaehwang Jung ,  Myoungki Ahn

IPC: H01L21/67 ,  G01N21/21 ,  G01N21/95 ,  G06T7/00 ,  H01L21/66 ,  G01N21/17

CPC classification number: H01L21/67288 ,  G01N21/211 ,  G01N21/9501 ,  G06T7/001 ,  H01L22/12 ,  G01N2021/1765 ,  G01N2201/12 ,  G01N2201/13 ,  G06T2207/30148

Abstract: Provided is an imaging ellipsometry (IE)-based inspection method including selecting a mode from among a first mode of an IE-based inspection device having a first field of view (FOV) and a second mode of an IE-based inspection device having a second FOV, measuring an inspection target by the IE-based inspection device based on the selected mode, and determining whether the inspection target is normal based on a result of the measuring, wherein the measuring of the inspection target comprises simultaneously measuring patterns included in a plurality of cells provided in a region of the inspection target, the region corresponding to an FOV of the selected mode.