公开(公告)号：US20140076105A1

公开(公告)日：2014-03-20

申请号：US14087371

申请日：2013-11-22

Applicant: Samsung Electronics Co., Ltd.

Inventor： Sang Joon HONG ,  Oui Serg KIM ,  Sang Hyun PARK ,  Roger Francisus Mattheus M HAMELINCK

IPC: F16H21/44

CPC classification number: F16H21/44 ,  G03F7/70391 ,  Y10T74/18888

Abstract: A gantry apparatus includes a structure to couple and support an optical system has enhanced rigidity, which minimizes deformation of the structure even if a plurality of optical systems is coupled to the structure. The gantry apparatus includes an optical system, a drive device to drive the optical system, and a structure to couple and support the drive device. The structure includes a plurality of first plates arranged parallel to one another, and a plurality of second plates intersecting the plurality of first plates to define receptive corridors, each of which receives the drive device.

Abstract translation: 台架装置包括用于联接和支撑光学系统的结构，其具有增强的刚性，即使多个光学系统耦合到该结构，也能最小化结构的变形。 龙门装置包括光学系统，用于驱动光学系统的驱动装置和用于联接和支撑驱动装置的结构。 该结构包括彼此平行布置的多个第一板，以及与多个第一板相交的多个第二板，以限定可接收的走廊，每个都容纳驱动装置。

公开(公告)号：US20240248418A1

公开(公告)日：2024-07-25

申请号：US18434948

申请日：2024-02-07

Applicant: Samsung Electronics Co., Ltd.

Inventor： Seok HEO ,  Cha Won KOH ,  Sang Joon HONG ,  Hyun Woo KIM ,  Kyung-Won KANG ,  Dong-Wook KIM ,  Kyung Won SEO ,  Young Il JANG ,  Yong Suk CHOI

IPC: G03F7/00 ,  G03F7/16 ,  H01L21/677 ,  H01L21/687

CPC classification number: G03F7/70875 ,  G03F7/168 ,  G03F7/70033 ,  H01L21/67703 ,  H01L21/68707

Abstract: A substrate processing apparatus includes a photoresist coater applying a photoresist film on a substrate, a humidifier increasing an amount of moisture in an ambient to which the photoresist film on the substrate is exposed, and an exposer irradiating the photoresist film exposed to the ambient having the increased amount of moisture with light. The humidifier is disposed between the photoresist coater and the exposer.