公开(公告)号：US20240248418A1

公开(公告)日：2024-07-25

申请号：US18434948

申请日：2024-02-07

Applicant: Samsung Electronics Co., Ltd.

Inventor： Seok HEO ,  Cha Won KOH ,  Sang Joon HONG ,  Hyun Woo KIM ,  Kyung-Won KANG ,  Dong-Wook KIM ,  Kyung Won SEO ,  Young Il JANG ,  Yong Suk CHOI

IPC: G03F7/00 ,  G03F7/16 ,  H01L21/677 ,  H01L21/687

CPC classification number: G03F7/70875 ,  G03F7/168 ,  G03F7/70033 ,  H01L21/67703 ,  H01L21/68707

Abstract: A substrate processing apparatus includes a photoresist coater applying a photoresist film on a substrate, a humidifier increasing an amount of moisture in an ambient to which the photoresist film on the substrate is exposed, and an exposer irradiating the photoresist film exposed to the ambient having the increased amount of moisture with light. The humidifier is disposed between the photoresist coater and the exposer.

公开(公告)号：US20230130025A1

公开(公告)日：2023-04-27

申请号：US17938338

申请日：2022-10-06

Applicant: Samsung Electronics Co., Ltd.

Inventor： Cha Won KOH ,  Tsunehiro NISHI ,  Ji Young PARK ,  Dong Il SHIN ,  Chang Soo WOO ,  Min Young LEE ,  Hyun Jae LEE

IPC: G03F7/029 ,  G03F7/039 ,  G03F7/004 ,  G03F7/20

Abstract: A photoresist composition including an organometallic compound, and a method for fabricating a semiconductor device using the same are provided. The photoresist composition may include an organometallic compound, a radical sensitizer including a structure of Chemical formula 2-1 or Chemical formula 2-2, and a solvent.
In Chemical formula 2-1, A1 is a substituted or unsubstituted hydrocarbon group having 1 to 20 carbon atoms, and R1, R2 and R3 are each independently hydrogen, a halogen, a substituted or unsubstituted hydrocarbon group having 1 to 20 carbon atoms, or a hetero-functional group.
In Chemical formula 2-2, A2 is a substituted or unsubstituted hydrocarbon group having 1 to 20 carbon atoms, and R4 and R5 are each independently hydrogen, a halogen, a substituted or unsubstituted hydrocarbon group having 1 to 20 carbon atoms, or a hetero-functional group.