Method of forming semiconductor device
    1.
    发明授权
    Method of forming semiconductor device 有权
    半导体器件形成方法

    公开(公告)号:US08741767B2

    公开(公告)日:2014-06-03

    申请号:US14091680

    申请日:2013-11-27

    Abstract: A semiconductor device includes a semiconductor substrate including a cell region and a core region adjacent to the cell region, active regions in the cell region and the core region, an interlayer insulating layer covering the active regions, upper cell contacts penetrating the interlayer insulating layer in the cell region, the upper cell contacts being adjacent to each other along a first direction and being electrically connected to the active regions, and core contacts penetrating the interlayer insulating layer in the active regions of the core region, the core contacts being adjacent to each other along the first direction and including upper connection core contacts electrically connected to the active regions, and dummy contacts adjacent to the upper connection core contacts, the dummy contacts being insulated from the active regions.

    Abstract translation: 半导体器件包括:半导体衬底,包括单元区域和与单元区域相邻的芯区域,单元区域和芯区域中的有源区域,覆盖有源区域的层间绝缘层,穿过层间绝缘层的上部单元触点 电池区域,上电池触点沿着第一方向彼此相邻并且电连接到有源区域,并且芯触点穿透芯区域的有源区域中的层间绝缘层,芯触点与每个区域相邻 另一个沿着第一方向并且包括电连接到有源区的上连接芯触点,以及与上连接芯触点相邻的虚拟触头,虚拟触头与有源区绝缘。

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