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    Display device with anti-reflection layer, and electronic device with the same
    2.
    发明授权
    Display device with anti-reflection layer, and electronic device with the same 有权

    公开(公告)号：US10411224B2

    公开(公告)日：2019-09-10

    申请号：US15937693

    申请日：2018-03-27

    Applicant: Samsung Electronics Co., Ltd

    Inventor： Jihun Heo ,  Ji Hoon Park ,  Sung-Soo Moon ,  Kemsuk Seo ,  Taeyoon An ,  Bong Jae Rhee ,  Chang-Su Lee

    IPC: H01L51/52 ,  H01L27/32 ,  H01L51/00 ,  B32B7/12 ,  B32B17/06 ,  H04M1/02

    Abstract: The present disclosure relates to an electronic device with a display device having enhanced display power consumption. The electronic device includes: a housing; a transparent member disposed in at least a portion of the housing, and includes an upper surface and a lower surface; a first anti-reflection layer coupled to the upper surface of the transparent member; and a display panel coupled to at least a portion of the lower surface of the transparent member by a visually transparent adhesive member, and housed in the housing. The display panel includes: a polarizing film layer coupled to the adhesive member and including an upper surface and lower surface; a light emitting layer disposed under the lower surface of the polarizing film layer; and a second anti-reflection layer disposed on the lower surface of the polarizing film layer between the lower surface of the polarizing film layer and the light emitting layer.

    Apparatus and method for monitoring semiconductor fabrication processes using polarized light
    3.
    发明授权
    Apparatus and method for monitoring semiconductor fabrication processes using polarized light 有权
    使用偏振光监测半导体制造工艺的装置和方法

    公开(公告)号：US09322771B2

    公开(公告)日：2016-04-26

    申请号：US14197608

    申请日：2014-03-05

    Applicant: Samsung Electronics Co., Ltd.

    Inventor： Woong-Kyu Son ,  Kwang-Hoon Kim ,  Deok-Yong Kim ,  Sung-Soo Moon ,  Jung-Hoon Byun ,  Ji-Hye Lee ,  Choon-Shik Leem ,  Soo-Bok Chin

    IPC: G01N21/33 ,  G01N21/21 ,  G03F7/22 ,  G03F7/20

    CPC classification number: H01L22/12 ,  G01N21/21 ,  G01N21/33 ,  G01N21/8806 ,  G01N21/9501 ,  G01N21/95607 ,  G01N2021/8848 ,  G03F7/70625

    Abstract: The inventive concept provides apparatuses and methods for monitoring semiconductor fabrication processes in real time using polarized light. In some embodiments, the apparatus comprises a light source configured to generate light, a beam splitter configured to reflect the light toward the wafer being processed, an objective polarizer configured to polarize the light reflected toward the wafer and to allow light reflected by the wafer to pass therethrough, a blaze grating configured to separate light reflected by the wafer according to wavelength, an array detector configured to detect the separated light and an analyzer to analyze the three-dimensional profile of the structure/pattern being formed in the wafer.

    Abstract translation: 本发明的概念提供了使用偏振光来实时监控半导体制造工艺的装置和方法。 在一些实施例中，该装置包括被配置为产生光的光源，被配置为将光朝向正被处理的晶片反射的分束器，物镜偏振器，被配置为使朝向晶片反射的光偏振，并允许由晶片反射的光 通过其配置成根据波长分离由晶片反射的光的火焰光栅，被配置为检测分离的光的阵列检测器和分析器，以分析在晶片中形成的结构/图案的三维轮廓。

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