公开(公告)号：US20230297746A1

公开(公告)日：2023-09-21

申请号：US18184902

申请日：2023-03-16

Applicant: Samsung Electronics Co., Ltd.

Inventor： Wangi SOHN ,  Dongjin PARK ,  Sunghyun BAE ,  Junyoung JANG

IPC: G06F30/31 ,  G06F30/392

CPC classification number: G06F30/31 ,  G06F30/392

Abstract: A layout design tool for generating a layout graphic based on a first input and a modification input includes a processing circuitry that generates a temporary layout in which a pattern is scripted based on the first input, and modifies the temporary layout based on the modification input to generate the layout graphic, and the processing circuitry designates a plurality of modification regions to be modified on the temporary layout based on the modification input and designates a plurality of transform regions on a background layer, the plurality of modification regions of the temporary layout, and the layout design tool generates a pattern layer by extracting the pattern group included in any one of the plurality of modification regions and generates the layout graphic by placing the pattern layer on the plurality of transform regions of the background layer.