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公开(公告)号：US20230136116A1
公开(公告)日：2023-05-04
申请号：US18078580
申请日：2022-12-09
发明人： Taejeong KIM , Jusung MAENG , Garam LEE , Jongkeun KIM , Jeongmi LEE , Junyoung JANG
摘要： An electronic device includes a display, a first housing, a second housing and a hinge assembly configured to connect the first housing and the second housing, and having a pair of hinge axes. The hinge assembly includes a hinge bracket including an intermediate protrusion formed to protrude in a direction of a middle axis perpendicular to the pair of hinge axes, a pair of hinge structures connected to the hinge bracket to be rotatable about the pair of hinge axes, and an intermediate member including a through-hole into which the intermediate protrusion is inserted, to be rotatable about the middle axis with respect to the hinge bracket. The intermediate protrusion also includes a protrusion base having a first radius, and a head including a projection which is formed on the protrusion base and which has a second radius greater than the first radius.
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2.发明公开公开(公告)号：US20240302758A1
公开(公告)日：2024-09-12
申请号：US18411581
申请日：2024-01-12
发明人： Ingyun CHUNG , Dongjin PARK , Sungyong MOON , Junyoung JANG
IPC分类号： G03F9/00
CPC分类号： G03F9/7046 , G03F9/7049 , G03F9/7088 , G03F9/7092
摘要： A pattern correction method includes acquiring, from a database, full shot data including full shot data coordinates and a misalignment value, calculating a deformation coefficient of the full shot data based on a cantilever beam analysis method with respect to the full shot data, extracting first-coordinate data along a first axis in a bit line direction and second-coordinate data along a second axis in a word line direction based on the full shot data, classifying the full shot data based on the first-coordinate data and the second-coordinate data, removing outliers from the full shot data.
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公开(公告)号：US20230297746A1
公开(公告)日：2023-09-21
申请号：US18184902
申请日：2023-03-16
发明人： Wangi SOHN , Dongjin PARK , Sunghyun BAE , Junyoung JANG
IPC分类号： G06F30/31 , G06F30/392
CPC分类号： G06F30/31 , G06F30/392
摘要： A layout design tool for generating a layout graphic based on a first input and a modification input includes a processing circuitry that generates a temporary layout in which a pattern is scripted based on the first input, and modifies the temporary layout based on the modification input to generate the layout graphic, and the processing circuitry designates a plurality of modification regions to be modified on the temporary layout based on the modification input and designates a plurality of transform regions on a background layer, the plurality of modification regions of the temporary layout, and the layout design tool generates a pattern layer by extracting the pattern group included in any one of the plurality of modification regions and generates the layout graphic by placing the pattern layer on the plurality of transform regions of the background layer.
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公开(公告)号：US20230205092A1
公开(公告)日：2023-06-29
申请号：US17954975
申请日：2022-09-28
发明人： Arin LEE , Kiho YANG , Jeeeun JUNG , Sungyong MOON , Junyoung JANG
IPC分类号： G03F7/20 , G06F30/398
CPC分类号： G03F7/70441 , G03F7/705 , G06F30/398
摘要： An optical proximity correction (OPC) method for manufacturing a semiconductor chip including detecting edges of an initial layout pattern and determining an edge violating a mask rule, among the edges, as a target edge, setting a reference control point (RCP) on the target edge, forming a multi-edge by dividing the target edge based on the RCP, setting additional control points on the multi-edge, forming a modified layout pattern by transforming the multi-edge into a curved edge based on the RCP and the additional control points, performing an OPC simulation based on the modified layout pattern, and calculating an edge placement error (EPE) of the modified layout pattern based on a result of the OPC simulation may be provided.
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