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公开(公告)号:US20240412960A1
公开(公告)日:2024-12-12
申请号:US18404645
申请日:2024-01-04
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor: Jawon KO , Jongwha LEE , Taijo JEON , Yunsong JEONG , Jaesup LEE , Solhee IN
IPC: H01J37/32
Abstract: A sensor device includes a first substrate, a second substrate on the first substrate, a plurality of detection units between the first substrate and the second substrate and configured to collect detection information from plasma formed in a space above the second substrate, a controller configured to generate characteristic data representing characteristics of the plasma based on the detection information collected by the plurality of detection units, and a power supply unit including a radio frequency (RF) energy harvester configured to produce power for operation of at least one of the plurality of detection units and the controller from RF power used to form the plasma.
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公开(公告)号:US20210033965A1
公开(公告)日:2021-02-04
申请号:US16901466
申请日:2020-06-15
Applicant: Samsung Electronics Co., Ltd.
Inventor: Ginam PARK , Sangmin KIM , Jongsam KIM , Hongjin KIM , Chuljun PARK , Yongjun AHN , Sangkyung LEE , Junyong LEE , Taijo JEON , Kyubum CHO
Abstract: An apparatus for storing a mask includes a main body comprising a first region and a second region, the first region having a plurality of mask containers, a gas supply pipe having an outer portion outside of the main body, a fan in the first region to propel the gas from the second region to the first region, a filter disposed at a front end and/or a rear end of the fan, a heat exchanger in the second region and configured to exchange heat with the flowing gas, a Peltier element at the outer portion of the gas supply pipe, a first sensor installed in the gas supply pipe upstream of the Peltier element, a second sensor installed in the second region in a lower position to the heat exchanger, and a controller connected to the first and second sensors and the Peltier element.
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公开(公告)号:US20250069871A1
公开(公告)日:2025-02-27
申请号:US18597432
申请日:2024-03-06
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor: Jonghwa LEE , Jawon KO , Taijo JEON , Yunsong JEONG
Abstract: A sensor apparatus for analyzing plasma in a plasma processing chamber, includes: a first substrate; a second substrate on the first substrate; and a plurality of sensors between the first substrate and the second substrate, the plurality of sensors being spaced apart from each other, wherein each of the plurality of sensors includes: (a) a sensing assembly that includes: (i) a wavelength selector on which light emitted from the plasma is incident and that is configured to separate wavelengths of a spectrum of the light, and (ii) a spectrometer that is optically connected to the wavelength selector and that is configured to detect the spectrum for each separated wavelength; and (b) a battery connected to the sensing assembly and configured to supply first power to the sensing assembly.
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公开(公告)号:US20250069869A1
公开(公告)日:2025-02-27
申请号:US18636962
申请日:2024-04-16
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor: Jonghwa LEE , Jawon KO , Taijo JEON , Yunsong JEONG
IPC: H01J37/32
Abstract: A plasma processing apparatus includes a chamber in which plasma is generated, a support portion configured to support an object to be processed within the chamber, a head portion within the chamber and opposite to the support portion in a first direction, and a plasma analyzer including: a plurality of light collectors in the head portion, the plurality of light collectors configured to receive light emitted from plasma at a plurality of positions, a spectrometer outside the chamber nd connected to the plurality of light collectors, and a multiplexer connected between the plurality of light collectors and the spectrometer, the multiplexer configured to select one of a plurality of lights transmitted from the plurality of light collectors and transmit the selected one of the plurality of lights to the spectrometer.
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公开(公告)号:US20200176293A1
公开(公告)日:2020-06-04
申请号:US16529082
申请日:2019-08-01
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor: Sangkyung LEE , Yong-Jun AHN , Taijo JEON , Kyubum CHO , Jongsam KIM , Gi-Nam PARK , Chul-Jun PARK , Junyong LEE
IPC: H01L21/673 , B05B1/30 , H01L21/67
Abstract: A semiconductor wafer storage system includes a container that provides a space in which a semiconductor wafer is to be stored, a fluid supply that provides a fluid to the container, a connection part that receives the fluid from the fluid supply and transfers the fluid to the container, and a nozzle part that connects the connection part to the container. The container may include a coupling plate to which the nozzle part is coupled, and the nozzle part may include a first nozzle and a second nozzle.
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