公开(公告)号：US11948964B2

公开(公告)日：2024-04-02

申请号：US16904708

申请日：2020-06-18

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Kangmook Lim ,  Sungin Kim ,  Changhwa Kim ,  Yeoseon Choi

IPC: H01L27/146

CPC classification number: H01L27/14643 ,  H01L27/14603 ,  H01L27/14614 ,  H01L27/14616 ,  H01L27/14621 ,  H01L27/1463

Abstract: An image sensor is disclosed. The image sensor includes a semiconductor substrate, a plurality of pillars protruding from the semiconductor substrate, and spaced from each other, a spacer layer on the semiconductor substrate and a sidewall of each of the plurality of pillars, a plurality of gate structures on the spacer layer, and a plurality of unit pixels arranged in a matrix form. The first unit pixel includes a first photodiode (PD) formed in the semiconductor substrate, a first pillar, a second pillar and a third pillar of the plurality of pillars, and a first gate structure and a second gate structure of the plurality of gate structures. Each of the first pillar and the second pillar includes a first channel region and a first drain region on the first channel region. The third pillar is not surround by any gate structure of the plurality of gate structures.

公开(公告)号：US12136643B2

公开(公告)日：2024-11-05

申请号：US17720010

申请日：2022-04-13

Applicant: Samsung Electronics Co., Ltd.

Inventor： Kangmook Lim ,  Seungsik Kim ,  Yeoseon Choi

IPC: H01L27/146

Abstract: An image sensor may include a first substrate having first and second surfaces and including unit pixel regions, each of which includes a device isolation pattern and a photoelectric conversion region adjacent to the first surface of the first substrate, a pixel isolation pattern provided in the first substrate to define the unit pixel regions and to penetrate the device isolation pattern, a first impurity region and a floating diffusion region provided in the first substrate and adjacent to the first surface, a second substrate provided on the first substrate to have third and fourth surfaces, a second impurity region provided in the second substrate and adjacent to the third surface, and ground and body contacts coupled to the first and second impurity regions, respectively. The ground contact and the body contact may be electrically separated from each other.

公开(公告)号：US20240242989A1

公开(公告)日：2024-07-18

申请号：US18406925

申请日：2024-01-08

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Yeoseon Choi ,  Unki Kim

IPC: H01L21/673 ,  H01J37/20

CPC classification number: H01L21/67336 ,  H01J37/20

Abstract: The present disclosure describes example apparatuses (e.g., grid structures) for fixing or holding a specimen, where the grid structure is formed by alternately stacking different layers (e.g., silicon (Si) layers and silicon germanium (SiGe) layers). For example, the alternate layers may be visually distinguishable from each other and may have a configured thickness. As such, based on the visual distinguishability between layers and the configured thickness for each layer, the grid structure may be used to adjust the magnification during inspection of the specimen. For example, the stacked layers may serve as a scale to control the magnification of the electron microscope while inspecting the specimen based on the configured or known thickness of the layers. Additionally, the orientation of the stacked layers may be used as a reference when a specimen is inspected.

公开(公告)号：US20240105417A1

公开(公告)日：2024-03-28

申请号：US18202155

申请日：2023-05-25

Applicant: Samsung Electronics Co., Ltd.

Inventor： Yeoseon Choi ,  Donghoon Kwon

IPC: H01J37/20 ,  H01J37/26

CPC classification number: H01J37/20 ,  H01J37/261 ,  H01J2237/2007

Abstract: A sample holder includes a head, a first holding plate extending in a first direction from one surface of the head and including at least one first sample hole configured to accommodate at least one first sample and a first main surface configured such that the at least one first sample accommodated in the at least one first sample hole is exposed at the first main surface, and a second holding plate extending in the first direction from the one surface of the head and including at least one second sample hole configured to accommodate at least one second sample and a second main surface configured such that the at least one second sample accommodated in the at least one second sample hole is exposed at the second main surface, wherein a direction perpendicular to the first main surface of the first holding plate differs from a direction perpendicular to the second main surface of the second holding plate.