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公开(公告)号:US11308310B2
公开(公告)日:2022-04-19
申请号:US16824980
申请日:2020-03-20
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor: Jineui Lee , Youngmin Seo , Yongcheol Park , Youngsoo Lee
IPC: G06K9/00
Abstract: An electronic device according to various embodiments may include an image sensor including a plurality of photodiodes, a display including a plurality of patterned openings, and a processor. The processor may be configured to control the electronic device to: acquire, through the image sensor, a first image using a plurality of incident light beams for a subject which pass through at least one of the plurality of openings, at least some of the plurality of incident light beams overlapping each other; acquire a second image representing the subject from the first image using a transfer function corresponding to the plurality of openings; and acquire information on the subject using the second image.
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公开(公告)号:US12200887B2
公开(公告)日:2025-01-14
申请号:US18155355
申请日:2023-01-17
Applicant: Samsung Electronics Co., Ltd.
Inventor: Youngkyong Jo , Wooktae Kim , Taehyeong Ryu , Jungkyu Park , Youngmin Seo , Bora Lee , Sangbong Lee , Wonho Lee , Jongsu Lee
Abstract: An electronic device is provided. The electronic device includes a foldable housing and a flexible display. The foldable housing may provide a front surface of the electronic device and a rear surface of the electronic device. The flexible display may be located in an inner space of the foldable housing. The flexible display may be combined with a front cover of the foldable housing providing the front surface. The front cover may include a pattern in which a plurality of openings corresponding to a folding portion of the foldable housing or a plurality of recesses provided in a surface facing the flexible display are periodically provided. A plurality of sub-pixels emitting light of a same wavelength in the flexible display may be arranged in a same direction as a direction in which the plurality of openings or the plurality of recesses are periodically arranged.
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公开(公告)号:US11977338B2
公开(公告)日:2024-05-07
申请号:US17340267
申请日:2021-06-07
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor: Jieun Park , Youngmin Seo , Inbeom Yim
CPC classification number: G03F7/70641 , G03F7/70683 , H01L22/20
Abstract: A method of manufacturing a semiconductor device includes selecting a diffraction based focus (DBF) mark that is unaffected by a pattern of a lower layer; manufacturing a mask including a mark pattern for forming the DBF mark; forming the DBF mark in a cell region of a wafer by using the mask; measuring the DBF mark and monitoring defocus; correcting the defocus on the basis of a result of the monitoring; and forming a pattern in the cell region of the wafer, after correcting the defocus.
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