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公开(公告)号：US20230094482A1
公开(公告)日：2023-03-30
申请号：US17724861
申请日：2022-04-20
发明人： Jeongyub LEE , Geunyoung YEOM , Heeju KIM , Jongwoo HONG , Yeonhee KIM , Kideok BAE , Haesoo BAE
摘要： A meta-optical device and a method of manufacturing a metasurface are provided. The meta-optical device includes a substrate and a nanostructure, wherein the nanostructure includes a first portion and a second portion that differ in at least one of a diameter and a period, wherein a ratio of an etch depth of the second portion to an etch depth of the first portion is about 0.9 to about 1.1, and the nanostructure includes at least one of sulfur, fluorine, and fluorocarbon.
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公开(公告)号：US20170316949A1
公开(公告)日：2017-11-02
申请号：US15498680
申请日：2017-04-27
申请人： RESEARCH & BUSINESS FOUNDATION SUNGKYUNKWAN UNIVERSITY , IUCF-HYU (Industry-University Cooperation Foundation Hanyang University)
发明人： Geunyoung YEOM , Kyong Nam KIM , Ki Seok KIM , Mu Kyeom MUN , Jinwoo PARK , Deokhyeon YUN , Jo-Won LEE
IPC分类号： H01L21/3065 , H01J37/32
CPC分类号： H01L21/3065 , H01J37/32009 , H01J37/3244 , H01J2237/334 , H01L21/67069 , H01L21/67115
摘要： The present disclosure relates to a method of etching an atomic layer, that is capable of simultaneously removing an upper surface and a side surface of an etch subject material layer by heating with a light source of a lamp when removing the atomic layer, thereby easily reducing the planar size even in the case of patterns in the scale of several nanometers.
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