公开(公告)号：US20240255842A1

公开(公告)日：2024-08-01

申请号：US18411690

申请日：2024-01-12

Applicant: SAMSUNG SDI CO., LTD.

Inventor： Sangmi KIM ,  Sunghwan KIM

IPC: G03F1/68

CPC classification number: G03F1/68

Abstract: A hardmask composition, a hardmask layer including a cured product of the aforementioned hardmask composition, and a method of forming patterns that includes using the hardmask layer including a cured product of the aforementioned hardmask composition, the hardmask composition including a solvent and a compound represented by Chemical Formula 1:

公开(公告)号：US20210408528A1

公开(公告)日：2021-12-30

申请号：US17359143

申请日：2021-06-25

Applicant: Samsung SDI Co., Ltd.

Inventor： Youngjoo CHAE ,  Gwiwoon KANG ,  Youngsun KONG ,  Sangmi KIM ,  Youngki KIM ,  Jinyoung KIM ,  Jaeyoung JEONG ,  Soonkie HONG

IPC: H01M4/36 ,  H01M4/525 ,  H01M10/0525 ,  C01G53/00

Abstract: Disclosed herein are a nickel-based lithium metal composite oxide, a method of preparing the same, and a lithium secondary battery including a positive electrode including the same. The nickel-based lithium metal composite oxide includes secondary particles including aggregates of primary particles, wherein a content of nickel in the nickel-based lithium metal composite oxide is 50 mol % or more, based on the total content of transition metals in the nickel-based lithium metal composite oxide, the secondary particles include large secondary particles having a particle size of 10 μm or more and small secondary particles having a particle size of 5 μm or less, and the content of nickel in the large secondary particles is larger than the content of nickel in the small secondary particles.

公开(公告)号：US20210109449A1

公开(公告)日：2021-04-15

申请号：US17064115

申请日：2020-10-06

Applicant: SAMSUNG SDI CO., LTD.

Inventor： Seunghyun KIM ,  Hyeonil JUNG ,  Sangmi KIM ,  Young Keun KIM ,  Sangchol PARK

IPC: G03F7/11 ,  G03F7/09 ,  G03F7/20 ,  G03F7/004 ,  G03F7/16

Abstract: A hardmask composition, a hardmask layer, and a method of forming patterns, the hardmask composition including a polymer including a structural unit represented by Chemical Formula 1; and a solvent,

公开(公告)号：US20230221641A1

公开(公告)日：2023-07-13

申请号：US17969931

申请日：2022-10-20

Applicant: SAMSUNG SDI CO., LTD.

Inventor： Seung-Wook SHIN ,  Yushin PARK ,  Seunghyun KIM ,  Sangchol PARK ,  Sangmi KIM ,  Seil CHOI ,  Huiseon CHOE

IPC: G03F7/09 ,  G03F7/00 ,  G03F7/20 ,  G03F7/40

CPC classification number: G03F7/09 ,  G03F7/0035 ,  G03F7/20 ,  G03F7/40

Abstract: A hardmask composition, a hardmask layer manufactured from the hardmask composition, and a method of forming patterns from the hardmask composition, the composition including a solvent; and a polymer including a structural unit represented by Chemical Formula 1,