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公开(公告)号：US11988960B2
公开(公告)日：2024-05-21
申请号：US17903369
申请日：2022-09-06
申请人： Inpria Corporation
CPC分类号： G03F7/0042 , G03F7/0043 , G03F7/09 , G03F7/20 , G03F7/2002 , G03F7/2037 , G03F7/30 , G03F7/32 , G03F7/322 , G03F7/325
摘要： Organometallic solutions have been found to provide high resolution radiation based patterning using thin coatings. The patterning can involve irradiation of the coated surface with a selected pattern and developing the pattern with a developing agent to form the developed image. The patternable coatings may be susceptible to positive-tone patterning or negative-tone patterning based on the use of an organic developing agent or an aqueous acid or base developing agent. The radiation sensitive coatings can comprise a metal oxo/hydroxo network with organic ligands. A precursor solution can comprise an organic liquid and metal polynuclear oxo-hydroxo cations with organic ligands having metal carbon bonds and/or metal carboxylate bonds.
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公开(公告)号：US20230221642A1
公开(公告)日：2023-07-13
申请号：US18083719
申请日：2022-12-19
发明人： CHEOLRAE JO , CHEOLLAE ROH , SANGJIN HAN , SEUNGHO MYOUNG
摘要： A mask, a mask assembly including a mask, and a substrate transfer apparatus including a mask. According to an embodiment, a mask includes a frame including an opening, accommodation structure disposed on the frame and including an accommodation space shielded from an outside, and a sensor disposed in the accommodation space.
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公开(公告)号：US20190211242A1
公开(公告)日：2019-07-11
申请号：US16329068
申请日：2017-08-25
IPC分类号： C09J179/04 , C09J9/00 , G03F7/09
CPC分类号： C09J179/04 , C08F290/06 , C08F290/061 , C08F290/064 , C08F299/02 , C08G59/26 , C08G59/3236 , C08G73/0622 , C08G73/0638 , C08G73/0644 , C08G73/0655 , C08G75/045 , C08G85/004 , C08K5/101 , C08K5/14 , C09J9/00 , C09J11/06 , C09J163/00 , C09J163/06 , C09J163/10 , C09J167/00 , C09J167/07 , C09J171/08 , C09J2205/31 , G03F7/004 , G03F7/027 , G03F7/09
摘要： A novel photosensitive adhesive composition including the following components (A), (B), (C), and (D): Component (A): a polymer having a structural unit of the following formula (1) and a structure of the following formula (2) at a terminal, Component (B): a polymer having the structural unit of formula (1), and a carboxy group or hydroxy group at a terminal, Component (C): a radical photopolymerization initiator, and Component (D): a solvent, wherein the content by mass of the component (B) is larger than that of the component (A), (wherein X is a C1-6 alkyl group, a vinyl group, an allyl group, or a glycidyl group, m and n are each independently 0 or 1, Q is a divalent C1-16 hydrocarbon group, Z is a divalent C1-4 linking group, the divalent linking group being bonded to an —O— group in formula (1), and R1 is a hydrogen atom or a methyl group.)
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公开(公告)号：US20180319194A1
公开(公告)日：2018-11-08
申请号：US15773322
申请日：2016-10-12
发明人： Tatsuo SHIGETA
CPC分类号： B41N1/22 , B32B1/08 , B32B27/08 , B32B2250/02 , B32B2597/00 , B41M1/08 , B41N1/003 , B41N1/14 , B41N1/16 , G03F7/00 , G03F7/09 , G03F7/11
摘要： Provided are an offset printing plate, an offset printing apparatus, and an offset printing method, which are capable of printing a high-definition image by waterless offset printing.The offset printing plate comprises: a cylindrical plate base material; a silicon resin layer formed on the cylindrical plate base material; and a resist pattern part formed on the silicon resin layer, in which the silicon resin layer serves as a non-printing area, and the resist pattern part serves as a printing area. The silicon resin layer is preferably formed on the cylindrical plate base material seamlessly.
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公开(公告)号：US10025179B2
公开(公告)日：2018-07-17
申请号：US14983220
申请日：2015-12-29
申请人： Inpria Corporation
CPC分类号： G03F7/0042 , G03F7/0043 , G03F7/09 , G03F7/20 , G03F7/2002 , G03F7/2037 , G03F7/30 , G03F7/32 , G03F7/322 , G03F7/325
摘要： Organometallic solutions have been found to provide high resolution radiation based patterning using thin coatings. The patterning can involve irradiation of the coated surface with a selected pattern and developing the pattern with a developing agent to form the developed image. The patternable coatings may be susceptible to positive-tone patterning or negative-tone patterning based on the use of an organic developing agent or an aqueous acid or base developing agent. The radiation sensitive coatings can comprise a metal oxo/hydroxo network with organic ligands. A precursor solution can comprise an organic liquid and metal polynuclear oxo-hydroxo cations with organic ligands having metal carbon bonds and/or metal carboxylate bonds.
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公开(公告)号：US09904169B2
公开(公告)日：2018-02-27
申请号：US15089788
申请日：2016-04-04
IPC分类号： G03F7/038 , G03F7/09 , G03F7/11 , G03F1/50 , G03F7/004 , G03F7/20 , G03F7/32 , G03F7/36 , G03F7/40 , G03F1/80 , G03F7/039
CPC分类号： G03F7/0382 , G03F1/50 , G03F1/80 , G03F7/0045 , G03F7/0046 , G03F7/039 , G03F7/09 , G03F7/093 , G03F7/11 , G03F7/2059 , G03F7/322 , G03F7/36 , G03F7/40 , G03F7/405
摘要： A photomask blank has a chemically amplified negative resist film comprising (A) a polymer comprising recurring units of specific structure and recurring units having fluorine, (B) a base resin adapted to reduce its solubility in alkaline developer under the action of acid, (C) an acid generator, and (D) a basic compound. The resist film is improved in receptivity to antistatic film.
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7.发明授权公开(公告)号：US09829805B2
公开(公告)日：2017-11-28
申请号：US15357085
申请日：2016-11-21
CPC分类号： G03F7/70716 , G03F7/09 , G03F7/167 , G03F7/2037
摘要： A photoresist vapor deposition system includes: a vacuum chamber having a heating element and cooled chuck for holding a substrate, the vacuum chamber having a heated inlet; and a vapor deposition system connected to the heated inlet for volatilizing a precursor into the vacuum chamber for condensing a photoresist over the substrate cooled by the cooled chuck. The deposition system creates a semiconductor wafer system that includes: a semiconductor wafer; and a vapor deposited photoresist over the semiconductor wafer. An extreme ultraviolet lithography system requiring the semiconductor wafer system includes: an extreme ultraviolet light source; a mirror for directing light from the extreme ultraviolet light source; a reticle stage for imaging the light from the extreme ultraviolet light source; and a wafer stage for placing a semiconductor wafer with a vapor deposited photoresist.
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公开(公告)号：US20170285474A1
公开(公告)日：2017-10-05
申请号：US15510619
申请日：2015-09-24
发明人： Mayuki YOSHIDA , Satoshi SHIBUI
CPC分类号： G03F7/033 , B32B2457/208 , G03F7/027 , G03F7/031 , G03F7/038 , G03F7/09 , G03F7/20 , G03F7/322 , G06F3/041
摘要： The present invention provides a photosensitive resin laminate in which (A) an alkali-soluble polymer, (B) a compound having an ethylenically unsaturated double bond, and (C) a photosensitive resin layer including a photopolymerization initiator are laminated on a support film. The photosensitive resin laminate is used in forming the protective film of a conductor part, the thickness of the photosensitive resin is 20 μm or less, and the cured product of the photosensitive resin layer satisfies conditions (1) to (3): (1) the crosslink density is 1,000 mol/m3-8,000 mol/m3; (2) the peak top value of Tan δ is 0.4 or greater; and (3) the refractive index at a wavelength of 532 nm is 1.50-1.60.
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公开(公告)号：US20170277036A1
公开(公告)日：2017-09-28
申请号：US15446531
申请日：2017-03-01
发明人： MINORU TORIUMI , TOSHIRO ITANI
CPC分类号： G03F7/0043 , B82Y30/00 , C01G23/047 , C01G25/02 , C01G27/00 , G03F7/0045 , G03F7/0392 , G03F7/09 , G03F7/162 , G03F7/168 , G03F7/2004 , G03F7/2037 , G03F7/325 , G03F7/327 , H01L21/0271 , H01L21/0274
摘要： According to one embodiment, a photosensitive composition includes a great number of photosensitive core-shell type nano-particles each including a core and a shell and having a structure that the core is metal oxide particle and covered by the shell. The shell includes a) unsaturated carboxylic acid or unsaturated carboxylate, which is a negatively ionized unsaturated carboxylic acid, and b) silylated unsaturated carboxylic acid or unsaturated carboxylate which is negatively ionized silylated unsaturated carboxylic acid.
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公开(公告)号：US20170261857A1
公开(公告)日：2017-09-14
申请号：US15102362
申请日：2014-10-30
发明人： Makiya ITO , Ryosuke ENDO , Kyungsung YUN , Hirofumi KONDO
CPC分类号： G03F7/2016 , G03F7/0002 , G03F7/0046 , G03F7/027 , G03F7/0755 , G03F7/09
摘要： A pattern formed body, including a cured resin layer 12 having a low surface free energy region a and a high surface free energy region b on a base 11, in which a difference in surface free energy between the low surface free energy region a and the high surface free energy region b is greater than 6 mJ/m2, and the low surface free energy region a and the high surface free energy region b are optically leveled surfaces. Accordingly, an ink is applied on the pattern formed body to easily color code.
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