Systems and methods for nanomaterial transfer
    1.
    发明授权
    Systems and methods for nanomaterial transfer 有权
    纳米材料转移的系统和方法

    公开(公告)号:US08173525B2

    公开(公告)日:2012-05-08

    申请号:US11454334

    申请日:2006-06-16

    IPC分类号: H01L21/00 H01L21/20

    摘要: Systems and methods of nanomaterial transfer are described. A method of nanomaterial transfer involving fabricating a template and synthesizing nanomaterials on the template. Subsequently, the nanomaterials are transferred to a substrate by pressing the template onto the substrate. In some embodiments, the step of transferring the nanomaterials involves pressing the template onto the substrate such that the nanomaterials are embedded below a surface layer of the substrate. In some embodiments, the temperature of the plurality of nanomaterials is raised to assist the transfer of the nanomaterials to the substrate.

    摘要翻译: 描述纳米材料转移的系统和方法。 纳米材料转移的方法涉及制作模板并在模板上合成纳米材料。 随后,通过将模板压在衬底上,将纳米材料转移到衬底。 在一些实施方案中,转移纳米材料的步骤包括将模板压在衬底上,使得纳米材料嵌入在衬底的表面层下面。 在一些实施方案中,提高多个纳米材料的温度以辅助将纳米材料转移到基底。

    Apparatus for in situ cleaning of carbon contaminated surfaces
    2.
    发明授权
    Apparatus for in situ cleaning of carbon contaminated surfaces 有权
    用于碳污染表面的原位清洁的设备

    公开(公告)号:US06772776B2

    公开(公告)日:2004-08-10

    申请号:US09956543

    申请日:2001-09-18

    IPC分类号: B08B312

    摘要: Activated gaseous species generated adjacent a carbon contaminated surface affords in-situ cleaning. A device for removing carbon contamination from a surface of the substrate includes (a) a housing defining a vacuum chamber in which the substrate is located; (b) a source of gaseous species; and (c) a source of electrons that are emitted to activate the gaseous species into activated gaseous species. The source of electrons preferably includes (i) a filament made of a material that generates thermionic electron emissions; (ii) a source of energy that is connected to the filament; and (iii) an electrode to which the emitted electrons are attracted. The device is particularly suited for photolithography systems with optic surfaces, e.g., mirrors, that are otherwise inaccessible unless the system is dismantled.

    摘要翻译: 在碳污染表面附近产生的活性气体物质可提供原位清洗。 用于从基板的表面去除碳污染的装置包括:(a)限定真空室的壳体,其中所述基板位于其中; (b)气态物质来源; 和(c)发射的电子源以将气态物质活化成活化的气态物质。 电子源优选包括(i)由产生热离子电子发射的材料制成的灯丝; (ii)连接到灯丝的能量源; 和(iii)发射的电子被吸引到的电极。 该装置特别适用于具有光学表面(例如镜子)的光刻系统,除非系统被拆除,否则不能进入。

    Method for in-situ cleaning of carbon contaminated surfaces
    3.
    发明授权
    Method for in-situ cleaning of carbon contaminated surfaces 有权
    碳污染表面原位清洗方法

    公开(公告)号:US07147722B2

    公开(公告)日:2006-12-12

    申请号:US10852545

    申请日:2004-05-24

    IPC分类号: B08B3/12 B08B6/00

    摘要: Activated gaseous species generated adjacent a carbon contaminated surface affords in-situ cleaning. A device for removing carbon contamination from a surface of the substrate includes (a) a housing defining a vacuum chamber in which the substrate is located; (b) a source of gaseous species; and (c) a source of electrons that are emitted to activate the gaseous species into activated gaseous species. The source of electrons preferably includes (i) a filament made of a material that generates thermionic electron emissions; (ii) a source of energy that is connected to the filament; and (iii) an electrode to which the emitted electrons are attracted. The device is particularly suited for photolithography systems with optic surfaces, e.g., mirrors, that are otherwise inaccessible unless the system is dismantled. A method of removing carbon contaminants from a substrate surface that is housed within a vacuum chamber is also disclosed. The method employs activated gaseous species that react with the carbon contaminants to form carbon containing gaseous byproducts.

    摘要翻译: 在碳污染表面附近产生的活性气体物质可提供原位清洗。 用于从基板的表面去除碳污染的装置包括:(a)限定真空室的壳体,其中所述基板位于其中; (b)气态物质来源; 和(c)发射的电子源以将气态物质活化成活化的气态物质。 电子源优选包括(i)由产生热离子电子发射的材料制成的灯丝; (ii)连接到灯丝的能量源; 和(iii)发射的电子被吸引到的电极。 该装置特别适用于具有光学表面(例如镜子)的光刻系统,除非系统被拆除,否则不能进入。 还公开了一种从容纳在真空室内的衬底表面除去碳污染物的方法。 该方法使用与碳污染物反应形成含碳气体副产物的活性气体物质。