公开(公告)号：US08740206B2

公开(公告)日：2014-06-03

申请号：US13013772

申请日：2011-01-25

申请人： Sandhya Arun ,  Prashanth Kodigepalli ,  Padma Gopalakrishnan ,  Ashish Bhatnagar ,  Dan Martin ,  Christopher Heath John Hossack

发明人： Sandhya Arun ,  Prashanth Kodigepalli ,  Padma Gopalakrishnan ,  Ashish Bhatnagar ,  Dan Martin ,  Christopher Heath John Hossack

IPC分类号： B25B1/20 ,  B25B1/22 ,  B24B1/00 ,  B24B29/00

CPC分类号： H01J37/32798 ,  C23C14/34 ,  C23C14/50 ,  H01J37/32495 ,  H01J37/32623 ,  H01J37/32642 ,  H01L21/67069 ,  H01L21/6831 ,  H01L21/68735

摘要： The present invention generally relates to a ring assembly that may be used in an etching or other plasma processing chamber. The ring assembly generally includes an inner ring and an outer ring disposed radially outward of the inner ring. The inner ring will correspond to the location where the majority of erosion occurs during use. This inner ring can be flipped and reused until both sides have eroded beyond their service life. Collectively, the two rings generally have the shape of a single piece ring, but the service life of the ring assembly is longer than a conventional single piece ring.

摘要翻译： 本发明一般涉及可用于蚀刻或其它等离子体处理室中的环组件。 环组件通常包括内环和设置在内环的径向外侧的外环。 内圈对应于使用过程中大部分侵蚀发生的位置。 该内圈可以翻转并重新使用，直到两侧都已经侵蚀超过其使用寿命。 总的来说，两个环通常具有单件环的形状，但是环组件的使用寿命比常规单件环长。

公开(公告)号：US20110180983A1

公开(公告)日：2011-07-28

申请号：US13013772

申请日：2011-01-25

申请人： SANDHYA ARUN ,  Prashanth Kodigepalli ,  Padma Gopalakrishnan ,  Ashish Bhatnagar ,  Dan Martin ,  Christopher Heath John Hossack

发明人： SANDHYA ARUN ,  Prashanth Kodigepalli ,  Padma Gopalakrishnan ,  Ashish Bhatnagar ,  Dan Martin ,  Christopher Heath John Hossack

IPC分类号： B25B1/00

CPC分类号： H01J37/32798 ,  C23C14/34 ,  C23C14/50 ,  H01J37/32495 ,  H01J37/32623 ,  H01J37/32642 ,  H01L21/67069 ,  H01L21/6831 ,  H01L21/68735

摘要： The present invention generally relates to a ring assembly that may be used in an etching or other plasma processing chamber. The ring assembly generally includes an inner ring and an outer ring disposed radially outward of the inner ring. The inner ring will correspond to the location where the majority of erosion occurs during use. This inner ring can be flipped and reused until both sides have eroded beyond their service life. Collectively, the two rings generally have the shape of a single piece ring, but the service life of the ring assembly is longer than a conventional single piece ring.

摘要翻译： 本发明一般涉及可用于蚀刻或其它等离子体处理室中的环组件。 环组件通常包括内环和设置在内环的径向外侧的外环。 内圈对应于使用过程中大部分侵蚀发生的位置。 该内圈可以翻转并重新使用，直到两侧都已经侵蚀超过其使用寿命。 总的来说，两个环通常具有单件环的形状，但是环组件的使用寿命比常规单件环长。