摘要:
According to an example embodiment of the present invention, a photoresist pattern is formed on a base substrate including a neutral layer. A sacrifice structure including a first sacrifice block and a second sacrifice block is formed on the base substrate having the photoresist pattern, and the sacrifice structure is formed from a first thin film including a first block copolymer. Thus, a chemical pattern is formed to form a nano-structure. Therefore, the nano-structure may be easily formed on a substrate having a large size by using a block copolymer, and productivity and manufacturing reliability may be improved.
摘要:
A random copolymer having a structure represented by the following Formula 1: wherein R is phosphonic acid, Me is a methyl group, x is a number of styrene units, and y is a number of methyl methacrylate units.
摘要:
A touch panel includes first and second normally spaced apart substrates. The first substrate includes first spaced apart touch electrodes extended in a first direction and each having a first width (W1). The second substrate includes second spaced apart touch electrodes extended in a different second direction and each having a second width (W2) which is substantially narrower than the first width. One of the substrates can be flexed so that momentary shorting contact is established between corresponding first and second touch electrodes at positions where pressing touch is provided. A combination of interconnect wirings and interrogation circuits are provided for automatically determining where and when the temporary shorting contacts were made, even if plural ones are simultaneously made. The disclosed embodiments include ones where the number of interconnect wirings are reduced.