UNDERLYING LAYER OF ALIGNMENT FILM FOR OXIDE SUPERCONDUCTING CONDUCTOR AND METHOD OF FORMING SAME, AND DEVICE FOR FORMING SAME
    1.
    发明申请
    UNDERLYING LAYER OF ALIGNMENT FILM FOR OXIDE SUPERCONDUCTING CONDUCTOR AND METHOD OF FORMING SAME, AND DEVICE FOR FORMING SAME 有权
    用于氧化物超导体导体及其形成方法的基底层的相应层及其形成装置

    公开(公告)号:US20120196752A1

    公开(公告)日:2012-08-02

    申请号:US13440516

    申请日:2012-04-05

    摘要: A method of forming an underlying layer of an alignment film for an oxide superconducting conductor, includes arranging two or more kinds of targets along a lengthwise direction of a base material so as to face a surface of the base material; simultaneously irradiating an ion beam on surfaces of the two or more kinds of targets to deposit constituent particles of the targets on the surface of the base material in the order of the arrangement of the two or more kinds of targets; and forming a laminate in which two or more kinds of thin films are repeatedly laminated on the surface of the base material by passing the base material through a deposition region of the constituent particles a plurality of times so that the constituent particles of the targets are repeatedly deposited on the surface of the base material at each passage.

    摘要翻译: 一种形成用于氧化物超导导体的取向膜的下层的方法包括沿着基材的长度方向布置两种或更多种靶,以面对基材的表面; 同时在两种或更多种目标的表面上照射离子束,以按照两种或更多种目标的排列顺序将目标的构成颗粒沉积在基材的表面上; 并且通过使基材多次通过组成颗粒的沉积区域,使基材的表面反复层压两种以上的薄膜,使得靶的构成颗粒重复地形成层叠体 在每个通道处沉积在基材的表面上。