公开(公告)号：US4979109A

公开(公告)日：1990-12-18

申请号：US3255

申请日：1987-01-14

申请人： Kazuaki Tanaka ,  Ichiro Yokoyama ,  Satoshi Wakayama ,  Yoshito Kamegi ,  Makoto Urakawa ,  Mikihiko Tokunaga ,  Takeshi Kamoshida ,  Shigeru Yoneda ,  Kiyotaka Kiyasu

发明人： Kazuaki Tanaka ,  Ichiro Yokoyama ,  Satoshi Wakayama ,  Yoshito Kamegi ,  Makoto Urakawa ,  Mikihiko Tokunaga ,  Takeshi Kamoshida ,  Shigeru Yoneda ,  Kiyotaka Kiyasu

IPC分类号： G06F12/00 ,  G06F17/30

CPC分类号： G06F17/30292

摘要： In a data dictionary directory system, the definition information to be registered in a dictionary is registered being divided into several definition units. A data base system registers the definition information and confirms the coordination of the contents of definition among the definition units. The definition information is registered without confirming the coordination. The coordination is confirmed when it becomes necessary to confirm the coordination among the definition informations registered in the dictionary.

摘要翻译： 在数据字典目录系统中，要注册在字典中的定义信息被分成几个定义单元。 数据库系统注册定义信息，确定定义单元之间定义内容的协调。 注册定义信息，无需确认协调。 当需要确认字典中注册的定义信息之间的协调时，确认协调。

公开(公告)号：US4833597A

公开(公告)日：1989-05-23

申请号：US7410

申请日：1987-01-27

申请人： Satoshi Wakayama ,  Ichiro Yokoyama ,  Kazuaki Tanaka ,  Yoshito Kamegi ,  Mikihiko Tokunaga ,  Takeshi Kamoshida ,  Shigeru Yoneda

发明人： Satoshi Wakayama ,  Ichiro Yokoyama ,  Kazuaki Tanaka ,  Yoshito Kamegi ,  Mikihiko Tokunaga ,  Takeshi Kamoshida ,  Shigeru Yoneda

IPC分类号： G06F12/00 ,  G06F17/30

CPC分类号： G06F17/30292

摘要： In a database having a dictionary/directory, the dictionary/directory is processed to form a directory using information in the dictionary, or is processed for other purposes. A process record including identification information associated with the process is stored in the dictionary/directory. In a dictionary deletion process, the stored record is designated and read out such that associated information indicated by the process record is also deleted in a batch manner.

摘要翻译： 在具有字典/目录的数据库中，使用字典中的信息来处理字典/目录以形成目录，或者为了其他目的而被处理。 包括与该过程相关联的识别信息的处理记录存储在字典/目录中。 在字典删除处理中，存储的记录被指定和读出，使得由处理记录指示的相关信息也以批处理方式被删除。

公开(公告)号：US4819160A

公开(公告)日：1989-04-04

申请号：US004072

申请日：1987-01-16

申请人： Kazuaki Tanka ,  Ichiro Yokoyama ,  Shigeru Yoneda ,  Satoshi Wakayama ,  Makoto Urakawa ,  Takashi Iihama

发明人： Kazuaki Tanka ,  Ichiro Yokoyama ,  Shigeru Yoneda ,  Satoshi Wakayama ,  Makoto Urakawa ,  Takashi Iihama

IPC分类号： G06F9/45 ,  G06F12/00 ,  G06F17/30 ,  G06F13/00 ,  G06F15/40

CPC分类号： G06F8/41 ,  G06F17/30371 ,  Y10S707/99934

摘要： In a database system having a dictionary/directory for collective management of definition information of the database system, when an application program is compiled to generate an object module, it is confirmed, by referring to the definition information stored in the dictionary, if a database access instruction in the application program is correctly operable. The confirmed definition information is incorporated within an object module which is edited to generate a load module. During execution of the load module, a database access control is effected using the definition information of the database system in the directory as well as the definition information incorporated at the compiling stage.

摘要翻译： 在具有用于数据库系统的定义信息的集体管理的字典/目录的数据库系统中，当编译应用程序以生成对象模块时，通过参考存储在字典中的定义信息来确认数据库 应用程序中的访问指令正确可操作。 确认的定义信息被并入被编辑以生成加载模块的对象模块内。 在执行加载模块期间，使用目录中的数据库系统的定义信息以及编译阶段中包含的定义信息来实现数据库访问控制。

公开(公告)号：US5531183A

公开(公告)日：1996-07-02

申请号：US274672

申请日：1994-07-13

申请人： Visweswaren Sivaramakrishnam ,  Hiroshi Nishizato ,  Jun Zhao ,  Ichiro Yokoyama

发明人： Visweswaren Sivaramakrishnam ,  Hiroshi Nishizato ,  Jun Zhao ,  Ichiro Yokoyama

IPC分类号： C23C16/44 ,  C23C16/40 ,  C23C16/448 ,  C23C16/455 ,  H01L21/205

CPC分类号： C23C16/401 ,  C23C16/448 ,  Y10S438/935 ,  Y10T117/1008

摘要： A process and apparatus is described for the processing of thin films on semiconductor substrates using one or more liquid precursor sources wherein the liquid precursor source with the highest vapor pressure is first vaporized and then introduced as a vapor into a common manifold connected to a processing chamber, with the point of introduction being spaced away from the processing chamber. A second liquid precursor source, having a vapor pressure lower than the first liquid precursor source, is then introduced in vaporized form into the manifold at a point closer to the processing chamber. This is repeated for each liquid precursor source, with each succeeding liquid precursor source having the next lower vapor pressure being introduced in vaporized form into the manifold at a point closer to the processing chamber than the previous liquid precursor source. A temperature gradient may then be maintained along the manifold with the temperature gradually increased in a direction toward the processing chamber while still mitigating premature boiling of the liquid precursor sources prior to vaporization, or condensation of already vaporized liquid precursor sources or components.

公开(公告)号：US06464782B1

公开(公告)日：2002-10-15

申请号：US08652194

申请日：1996-05-23

申请人： Visweswaren Sivaramakrishnam ,  Hiroshi Nishizato ,  Jun Zhao ,  Ichiro Yokoyama

发明人： Visweswaren Sivaramakrishnam ,  Hiroshi Nishizato ,  Jun Zhao ,  Ichiro Yokoyama

IPC分类号： C30B2516

CPC分类号： C23C16/401 ,  C23C16/448 ,  Y10S438/935 ,  Y10T117/1008

摘要： A process and apparatus is described for the processing of thin films on semiconductor substrates using one or more liquid precursor sources wherein the liquid precursor source with the highest vapor pressure is first vaporized and then introduced as a vapor into a common manifold connected to a processing chamber, with the point of introduction being spaced away from the processing chamber. A second liquid precursor source, having a vapor pressure lower than the first liquid precursor source, is then introduced in vaporized form into the manifold at a point closer to the processing chamber. This is repeated for each liquid precursor source, with each succeeding liquid precursor source having the next lower vapor pressure being introduced in vaporized form into the manifold at a point closer to the processing chamber than the previous liquid precursor source. A temperature gradient may then be maintained along the manifold with the temperature gradually increased in a direction toward the processing chamber while still mitigating premature boiling of the liquid precursor sources prior to vaporization, or condensation of already vaporized liquid precursor sources or components.

摘要翻译： 描述了一种用于使用一种或多种液体前体源在半导体衬底上处理薄膜的工艺和装置，其中首先蒸发具有最高蒸气压的液体前体源，然后作为蒸汽引入连接到处理室的公共歧管 导入点与处理室间隔开。 然后，具有低于第一液体前体源的蒸气压的第二液体前驱体源在更靠近处理室的点处以蒸发形式引入歧管。 对于每个液体前体源重复这一操作，其中每个随后的液体前体源具有下一个更低的蒸气压，以比先前的液体前体源更接近处理室的点以蒸发形式引入歧管。 然后可以沿着歧管保持温度梯度，其中温度在朝向处理室的方向上逐渐增加，同时在蒸发之前仍然减轻液体前体源的过早沸腾，或已经蒸发的液体前体源或组分的冷凝。

公开(公告)号：USD541542S1

公开(公告)日：2007-05-01

申请号：US29247111

申请日：2006-05-31

申请人： Ichiro Yokoyama ,  Daiju Nakagawa ,  Kelly Whalen ,  Hidetsugu Okazaki

设计人： Ichiro Yokoyama ,  Daiju Nakagawa ,  Kelly Whalen ,  Hidetsugu Okazaki