Aluminum nitride substrate and method of producing the same
    1.
    发明授权
    Aluminum nitride substrate and method of producing the same 失效
    氮化铝基板及其制造方法

    公开(公告)号:US5780162A

    公开(公告)日:1998-07-14

    申请号:US489677

    申请日:1995-06-13

    IPC分类号: H01L21/48 H01L23/15 B32B15/00

    摘要: An aluminum nitride (AlN) substrate comprising an AIN sinter, an Al.sub.2 O.sub.3 layer provided on the sinter, and a glass-mixed Al.sub.2 O.sub.3 layer which is provided on the Al.sub.2 O.sub.3 layer and contains Al.sub.2 O.sub.3 and glass mixed therewith, preferably with an oxide particle-dispersed glass layer and a main glass layer provided on the glass-mixed Al.sub.2 O.sub.3 layer. The AlN substrate has heat dissipation properties closer to those of AlN itself, does not cause generation of air bubbles at the junction interface between the AlN sinter and the glass-containing layer, and has excellent surface smoothness and corrosion resistance. The very fine conductive layer, etc. may be readily and firmly formed on the substrate in a stable manner.

    摘要翻译: 包含AlN烧结体,设置在烧结体上的Al 2 O 3层的氮化铝(AlN)衬底以及设置在Al 2 O 3层上并含有Al 2 O 3和玻璃的玻璃混合Al 2 O 3层,优选与氧化物粒子分散玻璃 层和设置在玻璃混合Al 2 O 3层上的主玻璃层。 AlN衬底具有更接近于AlN本身的散热性能,不会在AlN烧结体和含玻璃层之间的接合界面处产生气泡,并且具有优异的表面平滑性和耐腐蚀性。 非常细的导电层等可以以稳定的方式容易且牢固地形成在基板上。

    Method of making glazed AlN substrate with an Al.sub.2 O.sub.3
-SiO.sub.2 interfacial layer
    4.
    发明授权
    Method of making glazed AlN substrate with an Al.sub.2 O.sub.3 -SiO.sub.2 interfacial layer 失效
    制备具有Al2O3-SiO2界面层的釉面AlN衬底的方法

    公开(公告)号:US5466488A

    公开(公告)日:1995-11-14

    申请号:US193291

    申请日:1994-02-08

    IPC分类号: C04B41/52 C04B41/89 B05D3/02

    摘要: A glazed AlN substrate includes: a sintered AlN body, a surface oxidized layer formed on the sintered AlN body, an Al.sub.2 O.sub.3 --SiO.sub.2 layer formed on top of the intermediate surface oxidized layer, and a glass layer formed on top of the Al.sub.2 O.sub.3 --SiO.sub.2 layer. In one embodiment, an additional SiO.sub.2 layer is interposed between the glass layer and the Al.sub.2 O.sub.3 --SiO.sub.2 layer. A method of producing the AlN substrate is also disclosed that permits firing of the glass layer at high temperatures.

    摘要翻译: 釉面AlN基板包括:烧结AlN体,在烧结的AlN体上形成的表面氧化层,形成在中间表面氧化层的顶部的Al 2 O 3 -SiO 2层,以及形成在Al 2 O 3 -SiO 2层的顶部的玻璃层 。 在一个实施例中,在玻璃层和Al 2 O 3 -SiO 2层之间插入另外的SiO 2层。 还公开了一种制造AlN衬底的方法,其允许玻璃层在高温下烧制。