公开(公告)号：US20140238443A1

公开(公告)日：2014-08-28

申请号：US14190534

申请日：2014-02-26

Applicant: Semes Co., Ltd.

Inventor： Se Won LEE ,  Yong Hee LEE ,  Jae Yong KIM

IPC: H01L21/02

CPC classification number: H01L21/02052 ,  H01L21/67051 ,  H01L21/6708

Abstract: Provided is a substrate treatment apparatus. The apparatus includes a chuck supporting a substrate and being rotatable, a container surrounding the chuck and collecting chemicals scattered due to rotations of the substrate, and a first spray nozzle spraying the chemicals to the substrate.

Abstract translation: 提供了一种基板处理装置。 该装置包括支撑基板并且可旋转的卡盘，围绕卡盘的容器和收集由于基底的旋转而散射的化学药品以及将化学品喷洒到基底上的第一喷嘴。