NOZZLE AND SUBSTRATE TREATING APPARATUS INCLUDING THE SAME
    1.
    发明申请
    NOZZLE AND SUBSTRATE TREATING APPARATUS INCLUDING THE SAME 有权
    喷嘴和底板处理装置,包括它们

    公开(公告)号:US20170028413A1

    公开(公告)日:2017-02-02

    申请号:US15223931

    申请日:2016-07-29

    Abstract: A nozzle for supplying a fluid to a substrate, the nozzle including a body having a liquid discharge line through which the liquid flows and a gas discharge line that surrounds the liquid discharge line and through which a gas flow, wherein the body includes a plurality of liquid discharge holes that discharge the liquid flowing through the liquid discharge line, and a gas discharge hole that discharges the gas flowing through the gas discharge line.

    Abstract translation: 一种用于向衬底供应流体的喷嘴,所述喷嘴包括具有液体流过的液体排出管线的主体和围绕所述液体排出管线的气体排出管线,并且气体流过所述气体流体,其中所述主体包括多个 对流过液体排出管线的液体进行排出的液体排出孔以及排出通过气体排出管线的气体的气体排出孔。

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