公开(公告)号：US20200009621A1

公开(公告)日：2020-01-09

申请号：US16502272

申请日：2019-07-03

Applicant: SEMES CO., LTD.

Inventor： Min Sung Han ,  Doyeon KIM ,  Jinkyu KIM ,  Yoon Jong JU

IPC: B08B7/00 ,  H01L21/67

Abstract: An apparatus for processing a substrate compries a processing vessel having a processing space inside, a substrate support unit that supports and rotates the substrate in the processing vessel, and a nozzle unit that dispenses a processing liquid onto the substrate. The nozzle unit compries a nozzle that dispenses the processing liquid and an ultraviolet (UV) light supply unit that emits UV light to activate radicals of the processing liquid dispensed onto the substrate.

公开(公告)号：US20170028413A1

公开(公告)日：2017-02-02

申请号：US15223931

申请日：2016-07-29

Applicant: Semes Co., Ltd.

Inventor： Sehoon OH ,  Kihoon CHOI ,  Jinkyu KIM

IPC: B05B3/00

CPC classification number: B05B7/10 ,  B05B7/06 ,  B05B7/061 ,  B05B7/0815 ,  B05C5/0208 ,  H01L21/67051

Abstract: A nozzle for supplying a fluid to a substrate, the nozzle including a body having a liquid discharge line through which the liquid flows and a gas discharge line that surrounds the liquid discharge line and through which a gas flow, wherein the body includes a plurality of liquid discharge holes that discharge the liquid flowing through the liquid discharge line, and a gas discharge hole that discharges the gas flowing through the gas discharge line.

Abstract translation: 一种用于向衬底供应流体的喷嘴，所述喷嘴包括具有液体流过的液体排出管线的主体和围绕所述液体排出管线的气体排出管线，并且气体流过所述气体流体，其中所述主体包括多个 对流过液体排出管线的液体进行排出的液体排出孔以及排出通过气体排出管线的气体的气体排出孔。