公开(公告)号：US20220208561A1

公开(公告)日：2022-06-30

申请号：US17377666

申请日：2021-07-16

Applicant: Semes Co., Ltd.

Inventor： Yonghee LEE ,  Sangmin LEE ,  Euisang LIM ,  Dohyeon YOON

IPC: H01L21/67

Abstract: An apparatus for processing a substrate may include a process chamber providing a processing space in which a predetermined process may be performed on the substrate, and a supporting device contacting the process chamber and supporting the process chamber. The supporting device may include a supporting chamber providing a supporting space for supporting components of the process chamber and a supply member supplying a fluid into the supporting space.