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公开(公告)号：US09923127B2
公开(公告)日：2018-03-20
申请号：US14274143
申请日：2014-05-09
Applicant: Semiconductor Energy Laboratory Co., Ltd.
Inventor： Kaoru Tsuchiya , Aya Anzai , Masayuki Sakakura , Masaharu Nagai , Yutaka Matsuda
CPC classification number: H01L33/52 , H01L27/3244 , H01L27/3276 , H01L51/5246 , H01L2251/5323 , H01L2924/0002 , H01L2924/00
Abstract: An object of the present invention is to provide such a sealing structure that a material to be a deterioration factor such as water or oxygen is prevented from entering from external and sufficient reliability is obtained in a display using an organic or inorganic electroluminescent element. In view of the above object, focusing on permeability of an interlayer insulating film, deterioration of an electroluminescent element is suppressed and sufficient reliability is obtained by preventing water entry from an interlayer insulating film according to the present invention.
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Patent Agency Ranking
2.发明授权公开(公告)号：US08932097B2
公开(公告)日：2015-01-13
申请号：US14103251
申请日：2013-12-11
Applicant: Semiconductor Energy Laboratory Co., Ltd.
Inventor： Yutaka Matsuda , Takahiro Sato
CPC classification number: G03F9/7049 , G03F7/0035 , H01L33/36 , H01L2924/0002 , H01L2924/00
Abstract: A simple formation method of an insulating pattern having an eaves portion using one light-exposure mask is provided. As the formation method of an insulating pattern having an eaves portion, first, a first photosensitive organic layer is formed over a substrate, and then a first region is exposed to light with the use of a light-exposure mask, so that a leg portion is formed. After that, a second photosensitive organic layer is formed, the light-exposure mask is moved in the direction parallel to the substrate, and then a second region partly overlapping with the first region is exposed to light plural times, so that a stage portion is formed. The insulating pattern formed by this method may be applied to the light-emitting device or the lighting device.
Abstract translation: 提供了使用一个曝光掩模的具有檐部的绝缘图案的简单形成方法。 作为具有檐部的绝缘图案的形成方法，首先，在基板上形成第一感光性有机层，然后利用曝光掩模使第一区域曝光，从而使腿部 形成了。 之后，形成第二光敏有机层，使曝光掩模在与基板平行的方向上移动，然后与第一区域部分重叠的第二区域多次曝光，从而使台阶部分 形成。 通过该方法形成的绝缘图案可以应用于发光装置或照明装置。
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公开(公告)号：US10367124B2
公开(公告)日：2019-07-30
申请号：US15919780
申请日：2018-03-13
Applicant: Semiconductor Energy Laboratory Co., Ltd.
Inventor： Kaoru Tsuchiya , Aya Anzai , Masayuki Sakakura , Masaharu Nagai , Yutaka Matsuda
Abstract: An object of the present invention is to provide such a sealing structure that a material to be a deterioration factor such as water or oxygen is prevented from entering from external and sufficient reliability is obtained in a display using an organic or inorganic electroluminescent element. In view of the above object, focusing on permeability of an interlayer insulating film, deterioration of an electroluminescent element is suppressed and sufficient reliability is obtained by preventing water entry from an interlayer insulating film according to the present invention.
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公开(公告)号：US10903402B2
公开(公告)日：2021-01-26
申请号：US16522202
申请日：2019-07-25
Applicant: Semiconductor Energy Laboratory Co., Ltd.
Inventor： Kaoru Tsuchiya , Aya Anzai , Masayuki Sakakura , Masaharu Nagai , Yutaka Matsuda
Abstract: An object of the present invention is to provide such a sealing structure that a material to be a deterioration factor such as water or oxygen is prevented from entering from external and sufficient reliability is obtained in a display using an organic or inorganic electroluminescent element. In view of the above object, focusing on permeability of an interlayer insulating film, deterioration of an electroluminescent element is suppressed and sufficient reliability is obtained by preventing water entry from an interlayer insulating film according to the present invention.
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公开(公告)号：US20180204988A1
公开(公告)日：2018-07-19
申请号：US15919780
申请日：2018-03-13
Applicant: Semiconductor Energy Laboratory Co., Ltd.
Inventor： Kaoru Tsuchiya , Aya Anzai , Masayuki Sakakura , Masaharu Nagai , Yutaka Matsuda
CPC classification number: H01L33/52 , H01L27/3244 , H01L27/3276 , H01L51/5246 , H01L2251/5323 , H01L2924/0002 , H01L2924/00
Abstract: An object of the present invention is to provide such a sealing structure that a material to be a deterioration factor such as water or oxygen is prevented from entering from external and sufficient reliability is obtained in a display using an organic or inorganic electroluminescent element. In view of the above object, focusing on permeability of an interlayer insulating film, deterioration of an electroluminescent element is suppressed and sufficient reliability is obtained by preventing water entry from an interlayer insulating film according to the present invention.
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6.发明申请Insulating Pattern, Method of Forming the Insulating Pattern, Light-Emitting Device, Method of Manufacturing the Light-Emitting Device, and Lighting Device 有权绝缘图案，形成绝缘图案的方法，发光装置，发光装置的制造方法以及照明装置公开(公告)号：US20140099741A1
公开(公告)日：2014-04-10
申请号：US14103251
申请日：2013-12-11
Applicant: Semiconductor Energy Laboratory Co., Ltd.
Inventor： Yutaka Matsuda , Takahiro Sato
CPC classification number: G03F9/7049 , G03F7/0035 , H01L33/36 , H01L2924/0002 , H01L2924/00
Abstract: A simple formation method of an insulating pattern having an eaves portion using one light-exposure mask is provided. As the formation method of an insulating pattern having an eaves portion, first, a first photosensitive organic layer is formed over a substrate, and then a first region is exposed to light with the use of a light-exposure mask, so that a leg portion is formed. After that, a second photosensitive organic layer is formed, the light-exposure mask is moved in the direction parallel to the substrate, and then a second region partly overlapping with the first region is exposed to light plural times, so that a stage portion is formed. The insulating pattern formed by this method may be applied to the light-emitting device or the lighting device.
Abstract translation: 提供了使用一个曝光掩模的具有檐部的绝缘图案的简单形成方法。 作为具有檐部的绝缘图案的形成方法，首先，在基板上形成第一感光性有机层，然后利用曝光掩模使第一区域曝光，从而使腿部 形成了。 之后，形成第二光敏有机层，使曝光掩模在与基板平行的方向上移动，然后与第一区域部分重叠的第二区域多次曝光，从而使台阶部分 形成。 通过该方法形成的绝缘图案可以应用于发光装置或照明装置。
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