Abstract:
An image sensor comprises an active pixel sensor (APS) array, a first analog-to-digital converter (ADC), and a ramp signal generator. The APS array has includes a plurality of pixels of arranged in a second order two-dimensional matrix, and wherein the APS array generates a reset signal and an image signal for each pixel of selected columns. The first ADC has includes correlated double sampling (CDS) circuits for each column of the APS array, and wherein the first ADC generates a digital code corresponding to the difference between the reset signal and the image signal using an output ramp signal that is applied to the CDS circuits for each column. The ramp generator generates the output ramp signal in which a low illumination portion and a high illumination portion have different slopes.
Abstract:
An image sensor comprises an active pixel sensor (APS) array, a first analog-to-digital converter (ADC), and a ramp signal generator. The APS array has includes a plurality of pixels of arranged in a second order two-dimensional matrix, and wherein the APS array generates a reset signal and an image signal for each pixel of selected columns. The first ADC has includes correlated double sampling (CDS) circuits for each column of the APS array, and wherein the first ADC generates a digital code corresponding to the difference between the reset signal and the image signal using an output ramp signal that is applied to the CDS circuits for each column. The ramp generator generates the output ramp signal in which a low illumination portion and a high illumination portion have different slopes.
Abstract:
The present invention relates to an apparatus and method for protecting a semiconductor device, and more particularly to an n-type metal-oxide semiconductor (NMOS) transistor with a ladder structure, used for protecting a semiconductor device from electrostatic discharge. In the present invention, a plurality of drain branches are connected by resistors, and a contact point of the well and the source/well pattern is formed only alongside the drain branch of the ladder structure which is nearest an input/output terminal of the semiconductor device. Accordingly, the current is better dispersed to all of the drain branches, thereby preventing the voltage breakdown of the transistor due to heat caused by the localization of current in the drain branch farthest from the input/output terminal.
Abstract:
Provided are a semiconductor device including a high voltage transistor and a low voltage transistor and a method of manufacturing the same. The semiconductor device includes a semiconductor substrate including a high voltage region and a low voltage region; a high voltage transistor formed in the high voltage region and including a first active region, a first source/drain region, a first gate insulating layer, and a first gate electrode; and a low voltage transistor formed in the low voltage region and including a second active region, a second source/drain region, a second gate insulating layer, and a second gate electrode. The second source/drain region has a smaller thickness than a thickness of the first source/drain region.
Abstract:
Provided are a semiconductor device including a high voltage transistor and a low voltage transistor and a method of manufacturing the same. The semiconductor device includes a semiconductor substrate including a high voltage region and a low voltage region; a high voltage transistor formed in the high voltage region and including a first active region, a first source/drain region, a first gate insulating layer, and a first gate electrode; and a low voltage transistor formed in the low voltage region and including a second active region, a second source/drain region, a second gate insulating layer, and a second gate electrode. The second source/drain region has a smaller thickness than a thickness of the first source/drain region.
Abstract:
Provided are a pixel sensor array and a complementary metal-oxide semiconductor (CMOS) image sensor including the same. The pixel sensor array includes a photoelectric transformation element configured to generate electric charges in response to incident light. A signal transmitting circuit is configured to output the electric charges accumulated in the photoelectric transformation element to a first node based on a first control signal, change an electric potential of the first node to an electric potential of a second signal line based on a second control signal, and output a signal sensed in the first node to a first signal line based on a third control signal. A switch element is configured to connect a supply power terminal to the second signal line based on a fourth control signal. A comparator connected to the first signal line and the second signal line and configured to compare a voltage of the signal and a voltage of a reference signal.
Abstract:
Provided are a pixel sensor array and a complementary metal-oxide semiconductor (CMOS) image sensor including the same. The pixel sensor array includes a photoelectric transformation element configured to generate electric charges in response to incident light. A signal transmitting circuit is configured to output the electric charges accumulated in the photoelectric transformation element to a first node based on a first control signal, change an electric potential of the first node to an electric potential of a second signal line based on a second control signal, and output a signal sensed in the first node to a first signal line based on a third control signal. A switch element is configured to connect a supply power terminal to the second signal line based on a fourth control signal. A comparator connected to the first signal line and the second signal line and configured to compare a voltage of the signal and a voltage of a reference signal.