Method of polymer nanolithography
    1.
    发明授权
    Method of polymer nanolithography 失效
    聚合物纳米光刻法

    公开(公告)号:US07431970B1

    公开(公告)日:2008-10-07

    申请号:US10817406

    申请日:2004-03-25

    IPC分类号: B05D5/00

    摘要: An atomic force microscopy polymer nanolithography method is described. The method of the present invention enables rapid creation of raised or depressed features in a polymer film. The features are generated by mass transport of polymer within an initially uniform, planar film via localized softening of attoliters of polymer by Joule heating. This localized softening of the polymer is accomplished by current flow between the AFM tip and a conductive wafer upon which the layer of polymer is mounted.

    摘要翻译: 描述了原子力显微镜聚合物纳米光刻方法。 本发明的方法能够在聚合物膜中快速产生凸起或凹陷的特征。 这些特征是通过聚合物在初始均匀的平面膜内通过焦耳加热的聚合物的局部软化进行质量传递而产生的。 聚合物的这种局部软化通过AFM尖端和安装有聚合物层的导电晶片之间的电流来实现。

    Method of amplitude modulated electrostatic polymer nanolithography
    2.
    发明授权
    Method of amplitude modulated electrostatic polymer nanolithography 失效
    调幅静电聚合物纳米光刻技术

    公开(公告)号:US07241992B1

    公开(公告)日:2007-07-10

    申请号:US11040299

    申请日:2005-01-19

    IPC分类号: G01N13/16

    CPC分类号: G03F7/0002 G01Q80/00

    摘要: A method of amplitude modulated electrostatic polymer nanolithography providing rapid creation of features in a polymer film is disclosed. The nanolithography method of the present invention generates features by mass transport of polymer within an initially uniform, planar film via localized softening of attoliters (102-105 nm3) of polymer by Joule heating enabling high data densities upon the surface of the polymer. This localized Joule heating is accomplished by current flow between the cantilever AFM tip and a conductive wafer upon which the layer of polymer is grown or mounted.

    摘要翻译: 公开了一种在聚合物膜中提供快速产生特征的调幅静电聚合物纳米光刻技术。 本发明的纳米光刻方法通过使聚合物在最初均匀的平面薄膜内通过聚集体的局部软化(10-2 -25nm)进行质量传输而产生特征, 3)聚合物,通过焦耳加热,能够在聚合物表面上实现高数据密度。 这种局部焦耳加热是通过悬臂AFM尖端和聚合物层生长或安装在其上的导电晶片之间的电流来实现的。

    Method of Z-lift electrostatic nanolithography
    3.
    发明授权
    Method of Z-lift electrostatic nanolithography 失效
    Z升降静电纳米光刻方法

    公开(公告)号:US07538332B1

    公开(公告)日:2009-05-26

    申请号:US11217843

    申请日:2005-09-01

    IPC分类号: H01J37/26

    CPC分类号: G03F7/2049 G01Q80/00

    摘要: The method of the present invention utilizes atomic force microscopy techniques (AFM) for the reversible formation of nanoscale polymeric features by localized heating and mechanical deformation, generated through electrostatically mediated interactions across the polymer film between a conductive backplane and the cantilever AFM tip. This technique utilizes a selective lifting/placement of the cantilevered tip in the z direction (perpendicular to the planar surface of the polymer) to produce nanostructures of precise dimensions in contact AFM mode from regions of polymer locally heated by current flow between the cantilever AFM tip and the conductive substrate.

    摘要翻译: 本发明的方法利用原子力显微镜技术(AFM)通过局部加热和机械变形可逆形成纳米尺度的聚合物特征,通过在导电背板和悬臂AFM尖端之间的聚合物膜上的静电介导的相互作用产生。 这种技术利用在z方向(垂直于聚合物的平面)上的悬臂尖端的选择性提升/放置,以在接触AFM模式中产生具有精确尺寸的纳米结构,所述纳米结构由局部加热的聚合物区域通过悬臂AFM尖端之间的电流流动 和导电基板。