公开(公告)号：US07431970B1

公开(公告)日：2008-10-07

申请号：US10817406

申请日：2004-03-25

Applicant: Sergei Lyuksyutov ,  Shane Juhl ,  Richard Vaia

Inventor： Sergei Lyuksyutov ,  Shane Juhl ,  Richard Vaia

IPC: B05D5/00

CPC classification number: B81C1/00126 ,  B81C2201/0101 ,  G01Q80/00 ,  G03F7/0002 ,  G03F7/2049

Abstract: An atomic force microscopy polymer nanolithography method is described. The method of the present invention enables rapid creation of raised or depressed features in a polymer film. The features are generated by mass transport of polymer within an initially uniform, planar film via localized softening of attoliters of polymer by Joule heating. This localized softening of the polymer is accomplished by current flow between the AFM tip and a conductive wafer upon which the layer of polymer is mounted.

Abstract translation: 描述了原子力显微镜聚合物纳米光刻方法。 本发明的方法能够在聚合物膜中快速产生凸起或凹陷的特征。 这些特征是通过聚合物在初始均匀的平面膜内通过焦耳加热的聚合物的局部软化进行质量传递而产生的。 聚合物的这种局部软化通过AFM尖端和安装有聚合物层的导电晶片之间的电流来实现。

公开(公告)号：US20190162578A1

公开(公告)日：2019-05-30

申请号：US15824258

申请日：2017-11-28

Applicant: International Business Machines Corporation

Inventor： Jonathan Fry ,  Daniel Piper ,  Jang Sim ,  Yongchun Xin

IPC: G01F23/70 ,  G01F23/24 ,  G01F23/76

CPC classification number: G01F23/703 ,  B81B2201/0292 ,  B81C2201/0101 ,  B81C2203/05 ,  G01F23/241 ,  G01F23/76

Abstract: A self-cleaning sensor to determine a level of a liquid includes a tube with an interior coating and a plurality of horizontally aligned, electrically isolated, electrical contacts. The self-cleaning sensor includes the plurality of horizontally aligned, electrically isolated, electrical contacts that each terminate in an outer surface of an interior wall of the tube and are electrically connected to one or more electrical devices in a cap residing on the tube. Additionally, the self-cleaning sensor includes a float that is composed of a low density, low dielectric constant material buoyant in one or more liquids to be measured where each horizontal dimension of the float corresponds to each horizontal dimension of the tube.

公开(公告)号：US20080289182A1

公开(公告)日：2008-11-27

申请号：US12061512

申请日：2008-04-02

Applicant: Yoshitaka Zaitsu ,  Chienliu Chang ,  Masao Majima

Inventor： Yoshitaka Zaitsu ,  Chienliu Chang ,  Masao Majima

IPC: B23P13/00

CPC classification number: G02B26/0841 ,  B81C1/00634 ,  B81C2201/0101 ,  Y10T29/42 ,  Y10T29/49005 ,  Y10T29/49124 ,  Y10T29/49165 ,  Y10T29/49609

Abstract: A structure fabricating method plastically deforms a target portion of a substrate, to thereby fabricate a structure having an inclined segment that is inclined relative to a principal surface of the substrate. The method includes forming a projection on the target portion to project from the principal surface of the substrate or from an opposing surface of the substrate on the side opposite to the principal surface, and applying a force to the projection to plastically deform the target portion such that the target portion is bent in a direction from one surface of the substrate on the side where the projection is formed, toward another surface on the side opposite to the one surface.

Abstract translation: 结构制造方法使基板的目标部分塑性变形，从而制造具有相对于基板的主表面倾斜的倾斜段的结构。 所述方法包括在所述目标部分上形成突出部，从所述基板的主表面或与所述基板的与所述主表面相反的一侧的相对表面突出，并且向所述突起施加力以使所述目标部分塑性变形 目标部分沿着从形成有突起的一侧的基板的一个表面朝向与该一个表面相对的一侧的另一表面的方向弯曲。

公开(公告)号：US12036562B2

公开(公告)日：2024-07-16

申请号：US17207997

申请日：2021-03-22

Applicant: LG ELECTRONICS INC.

Inventor： Sanggu Lee ,  Bongjo Sung ,  Kyungsoo Yoon ,  Jihyun Kim

IPC: G03F7/20 ,  A61L9/22 ,  B01D53/32 ,  B03C3/32 ,  B03C3/68 ,  B03C3/82 ,  B81C1/00 ,  C01B13/11 ,  F24F1/0076 ,  G03F7/30 ,  H01L21/02 ,  B03C3/00 ,  B03C3/38 ,  F24F8/30

CPC classification number: B03C3/32 ,  A61L9/22 ,  B01D53/32 ,  B03C3/68 ,  B03C3/82 ,  B81C1/00103 ,  C01B13/115 ,  F24F1/0076 ,  G03F7/2014 ,  G03F7/30 ,  H01L21/02 ,  A61L2209/16 ,  B01D2257/90 ,  B01D2258/06 ,  B01D2259/818 ,  B03C3/00 ,  B03C3/38 ,  B81C2201/0101 ,  F24F8/30

Abstract: An ion generating device, a method for manufacturing an ion generating device, and an air conditioner are provided. The ion generating device may include a discharge electrode that generates ions, and a power supply that applies power to the discharge electrode. The discharge electrode may include a support formed of a conductor, and a discharge pin formed to protrude from a surface of the support and having a tip. The discharge pin may include nickel (Ni).

公开(公告)号：US11766696B2

公开(公告)日：2023-09-26

申请号：US16784186

申请日：2020-02-06

Applicant: BFLY Operations, Inc.

Inventor： Lingyun Miao ,  Jianwei Liu ,  Jonathan M. Rothberg

IPC: B06B1/00 ,  B06B1/02 ,  H10N30/06

CPC classification number: B06B1/0292 ,  H10N30/06 ,  B81B2201/0271 ,  B81B2203/0315 ,  B81B2203/04 ,  B81C2201/0101 ,  B81C2201/013 ,  B81C2201/0147 ,  B81C2201/0174 ,  B81C2203/0714

Abstract: A method of forming an ultrasonic transducer device includes forming a patterned metal electrode layer over a substrate, the patterned metal electrode layer comprising a lower layer and an upper layer formed on the lower layer; forming an insulation layer over the patterned metal electrode layer; and planarizing the insulation layer to the upper layer of the patterned metal electrode layer, wherein the upper layer comprises a electrically conductive material that serves as a chemical mechanical polishing (CMP) stop layer that has CMP selectivity with respect to the insulation layer and the lower layer, and wherein the upper layer has a CMP removal rate slower than that of the insulation layer.

公开(公告)号：US12070307B2

公开(公告)日：2024-08-27

申请号：US17132165

申请日：2020-12-23

Applicant: International Business Machines Corporation

Inventor： Neil Ebejer ,  Ute Drechsler ,  Patrick Ruch

IPC: A61B5/145 ,  A61B5/00 ,  A61B5/1473 ,  H05K3/00 ,  A61B10/00

CPC classification number: A61B5/14514 ,  A61B5/1473 ,  A61B5/685 ,  H05K3/0014 ,  A61B2010/008 ,  A61B2562/125 ,  B81C2201/0101 ,  B81C2201/0108 ,  B81C2201/013 ,  B81C2201/0147 ,  B81C2201/056

Abstract: A sensor device, such as a biosensor, may comprise a polymer substrate, which is structured so as to form sets of microneedles and respective vias. The microneedles extend, each, from a base surface of the substrate. Each of the vias extends through a thickness of the substrate, thereby forming a corresponding set of apertures on the base surface. Each of the apertures is adjacent to a respective one of the microneedles. The device further may comprise two or more electrodes, these including a sensing electrode and a reference electrode. Each electrode may comprise an electrically conductive material layer that coats a region of the substrate, so as to coat at least some of the microneedles and neighboring portions of said base surface. Related devices, apparatuses, and methods of fabrication and use of such devices may be provided.

公开(公告)号：US11912563B2

公开(公告)日：2024-02-27

申请号：US17287389

申请日：2019-12-13

Applicant: Robert Bosch GmbH

Inventor： Hans Artmann ,  Christoph Hermes ,  Heribert Weber ,  Jochen Reinmuth ,  Peter Schmollngruber ,  Thomas Friedrich

IPC: B81B3/00 ,  B81C1/00 ,  G01L7/08 ,  G01L9/00

CPC classification number: B81B3/0072 ,  B81C1/00158 ,  G01L7/082 ,  G01L9/0072 ,  B81B2201/0264 ,  B81B2203/0127 ,  B81B2203/0307 ,  B81C2201/0101

Abstract: A micromechanical component, whose diaphragm is supported and has support structures on its inner diaphragm side. Each of the support structures includes a first and second edge element structure, and at least one intermediate element structure positioned between the first and second edge element structures. For each of the support structures, a plane of symmetry is definable, with respect to which at least the first edge element structure of the respective support structure and the second edge element structure of the respective support structure are specularly symmetric. In each of support structures, a first maximum dimension of its first edge element structure perpendicular to its plane of symmetry and a second maximum dimension of its second edge element structure perpendicular to its plane of symmetry are greater than the maximum dimension of its intermediate element structure perpendicular to its plane of symmetry.

公开(公告)号：US08136212B2

公开(公告)日：2012-03-20

申请号：US12061512

申请日：2008-04-02

Applicant: Yoshitaka Zaitsu ,  Chienliu Chang ,  Masao Majima

Inventor： Yoshitaka Zaitsu ,  Chienliu Chang ,  Masao Majima

IPC: H04R17/00

CPC classification number: G02B26/0841 ,  B81C1/00634 ,  B81C2201/0101 ,  Y10T29/42 ,  Y10T29/49005 ,  Y10T29/49124 ,  Y10T29/49165 ,  Y10T29/49609

Abstract: A structure fabricating method plastically deforms a target portion of a substrate, to thereby fabricate a structure having an inclined segment that is inclined relative to a principal surface of the substrate. The method includes forming a projection on the target portion to project from the principal surface of the substrate or from an opposing surface of the substrate on the side opposite to the principal surface, and applying a force to the projection to plastically deform the target portion such that the target portion is bent in a direction from one surface of the substrate on the side where the projection is formed, toward another surface on the side opposite to the one surface.

Abstract translation: 结构制造方法使基板的目标部分塑性变形，从而制造具有相对于基板的主表面倾斜的倾斜段的结构。 所述方法包括在所述目标部分上形成突出部，从所述基板的主表面或与所述基板的与所述主表面相反的一侧的相对表面突出，并且向所述突起施加力以使所述目标部分塑性变形 目标部分沿着从形成有突起的一侧的基板的一个表面朝向与该一个表面相对的一侧的另一表面的方向弯曲。