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公开(公告)号：US10184167B2
公开(公告)日：2019-01-22
申请号：US14897182
申请日：2014-03-30
Applicant: Sharp Kabushiki Kaisha
Inventor： Yuhki Kobayashi , Katsuhiro Kikuchi , Shinichi Kawato , Satoshi Inoue , Takashi Ochi , Eiichi Matsumoto , Masahiro Ichihara
Abstract: A vapor deposition unit (1) includes a vapor deposition mask (50), a vapor deposition source (10), and a limiting plate unit (20). The limiting plate unit (20) includes (i) a plurality of first limiting plates (32) separated from each other in an X axis direction and (ii) a plurality of second limiting plates (42) disposed directly above the first limiting plates (32) in a plan view and separated from each other in the X axis direction. At least two second limiting plates (42) are arranged in the X axis direction for each first limiting plate (32).
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公开(公告)号：US10103202B2
公开(公告)日：2018-10-16
申请号：US15317156
申请日：2015-06-11
Applicant: Sharp Kabushiki Kaisha
Inventor： Shinichi Kawato , Katsuhiro Kikuchi , Satoshi Inoue , Takashi Ochi , Yuhki Kobayashi , Kazuki Matsunaga , Eiichi Matsumoto , Masahiro Ichihara
Abstract: In an organic EL element including a positive electrode, a negative electrode, and a light emitting layer (recombination layer) provided between the positive electrode and the negative electrode, an electron transport layer and an electron injection layer are provided between the light emitting layer and the negative electrode, and are sequentially arranged in the direction from the light emitting layer to the negative electrode. A hole injection layer and a hole transport layer are provided between the light emitting layer and the positive electrode, and are sequentially arranged in the direction from the positive electrode to the light emitting layer. A buffer layer for suppressing the electron trapping properties is provided between the light emitting layer and the hole transport layer.
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公开(公告)号：US09365923B2
公开(公告)日：2016-06-14
申请号：US14765557
申请日：2014-01-28
Applicant: SHARP KABUSHIKI KAISHA
Inventor： Takashi Ochi , Shinichi Kawato , Yuhki Kobayashi , Manabu Niboshi , Satoshi Inoue , Yuto Tsukamoto , Katsuhiro Kikuchi , Masahiro Ichihara , Eiichi Matsumoto
CPC classification number: C23C16/042 , C23C14/04 , C23C14/12 , H01L51/001 , H01L51/50
Abstract: The vapor deposition device includes a plurality of vapor deposition masks whose lengths in Y axis and X axis directions are shorter than those of a film formation target substrate. Vapor deposition masks adjacent to each other in the Y axis direction is positionally displaced in the X axis direction. In an overlapping area in which mask opening group areas adjacent to each other in the Y axis direction overlap with each other in the X axis direction, opening lengths in the Y axis direction become shorter toward the outer side of each of the mask opening group areas in the plan view.
Abstract translation: 气相沉积装置包括多个蒸镀掩模，其长度在Y轴和X轴方向上短于成膜靶基板的长度。 在Y轴方向上彼此相邻的蒸镀掩模在X轴方向上位移。 在Y轴方向上彼此相邻的掩模开口组区域在X轴方向上重叠的重叠区域中，Y轴方向的开口长度朝向每个掩模开口组区域的外侧变短 在平面图中。
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4.发明授权Method for producing organic electroluminescent element, and organic electroluminescent display device 有权制造有机电致发光元件的方法和有机电致发光显示装置公开(公告)号：US09537096B2
公开(公告)日：2017-01-03
申请号：US14900541
申请日：2014-05-01
Applicant: Sharp Kabushiki Kaisha
Inventor： Satoshi Inoue , Katsuhiro Kikuchi , Shinichi Kawato , Takashi Ochi , Yuhki Kobayashi , Masahiro Ichihara , Eiichi Matsumoto
CPC classification number: H01L51/0011 , C23C14/042 , C23C14/24 , H01L27/3244 , H01L51/5012
Abstract: The present invention provides a method for producing an organic EL element capable of shortening the film formation time while suppressing an increase in the blur width; and an organic EL display device. The method is for producing an organic EL element by scanning vapor deposition, in which one or more vapor deposition sources each are provided with ejection orifices that face the respective openings of a limiting plate, and the ejection orifices facing the same opening are spaced from each other to give a sum of distributions.
Abstract translation: 本发明提供了一种制造能够缩短成膜时间同时抑制模糊宽度增加的有机EL元件的方法; 和有机EL显示装置。 该方法是通过扫描气相沉积来生产有机EL元件，其中一个或多个气相沉积源各自具有面对限制板的相应开口的喷射口，并且面向相同开口的喷射孔与每个 另外给出一个分布的总和。
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公开(公告)号：US09614155B2
公开(公告)日：2017-04-04
申请号：US14903603
申请日：2014-03-04
Applicant: Sharp Kabushiki Kaisha
Inventor： Yoshiyuki Isomura , Katsuhiro Kikuchi , Shinichi Kawato , Satoshi Inoue , Takashi Ochi , Yuhki Kobayashi , Eiichi Matsumoto , Masahiro Ichihara
CPC classification number: H01L51/0011 , C23C14/042 , C23C14/12 , C23C16/458 , H01L27/3241 , H01L51/50 , H01L51/5012
Abstract: The vapor deposition apparatus employs scanning vapor deposition, and includes a limiting component including a first plate portion; a second plate portion provided with a space from the first plate portion; and a joint portion combining the first plate portion with the second plate portion, the first plate portion being provided with an first opening, the second plate portion being provided with an second opening that faces the first opening, the vapor deposition apparatus including a first space between the first opening and the second opening, the vapor deposition apparatus including a second space between the first plate portion and the second plate portion, the first space being connected to the second space, the vapor deposition apparatus including a third space that is in the outside of the limiting component, the second space being connected to the third space.
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Patent Agency Ranking
6.发明授权公开(公告)号：US09493872B2
公开(公告)日：2016-11-15
申请号：US14910642
申请日：2014-07-25
Applicant: Sharp Kabushiki Kaisha
Inventor： Shinichi Kawato , Satoshi Inoue , Takashi Ochi , Yuhki Kobayashi , Katsuhiro Kikuchi , Eiichi Matsumoto , Masahiro Ichihara
CPC classification number: C23C14/24 , C23C14/042 , H01L27/3211 , H01L51/0011 , H01L51/5012 , H01L51/56
Abstract: The present invention provides a vapor deposition apparatus capable of preventing abnormal film formation due to scattering in vapor deposition streams; and a method for producing an organic electroluminescent element which includes forming a patterned thin film with the vapor deposition apparatus. The present invention relates to a vapor deposition apparatus that includes a vapor deposition source equipped with a nozzle that ejects vapor deposition particles; an integrated limiting plate equipped with a first limiting plate including an opening that is in front of the nozzle, and with second limiting plates placed in the opening in the first limiting plate; and a mask including slits. The present invention also relates to a method for producing electroluminescent elements that includes a vapor deposition step of forming a patterned thin film with the vapor deposition apparatus.
Abstract translation: 本发明提供一种能够防止由于气相沉积物流中的散射引起的异常成膜的气相沉积装置; 以及制造有机电致发光元件的方法，其包括用蒸镀装置形成图案化薄膜。 蒸镀装置技术领域本发明涉及一种蒸镀装置，其特征在于，具备：喷射蒸镀粒子的喷嘴的蒸镀源， 集成限位板，其配备有包括位于喷嘴前面的开口的第一限位板，以及放置在第一限位板中的开口中的第二限位板; 以及包括狭缝的面罩。 本发明还涉及一种用于制造电致发光元件的方法，其包括用气相沉积装置形成图案化薄膜的气相沉积步骤。
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公开(公告)号：US10276797B2
公开(公告)日：2019-04-30
申请号：US15527065
申请日：2015-11-10
Applicant: Sharp Kabushiki Kaisha
Inventor： Masahiro Ichihara , Eiichi Matsumoto , Yuhki Kobayashi , Katsuhiro Kikuchi , Shinichi Kawato , Takashi Ochi , Kazuki Matsunaga , Satoshi Inoue
Abstract: The present invention provides a vapor deposition device including a novel alignment mechanism applicable to a large substrate, a vapor deposition method, and a method for manufacturing an organic electroluminescence element. The vapor deposition device of the present invention is a vapor deposition device for performing vapor deposition while transporting a substrate in a first direction, and includes: a mask; a substrate tray including a substrate-holding portion and a guide portion protruding from the substrate-holding portion to the mask side and disposed along the first direction; at least one distance meter disposed on a first end which is one end of the mask or the guide portion; and at least one driver coupled with a second end which is the other end of the mask. The at least one distance meter is configured to measure a distance between the at least one distance meter and the guide portion or the first end when the guide portion faces the first end. The at least one driver is capable of driving the mask in a second direction perpendicular to the first direction based on the measured value of the at least one distance meter.
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公开(公告)号：US09893283B2
公开(公告)日：2018-02-13
申请号：US15102132
申请日：2014-11-27
Applicant: Sharp Kabushiki Kaisha
Inventor： Yuhki Kobayashi , Katsuhiro Kikuchi , Shinichi Kawato , Takashi Ochi , Satoshi Inoue , Kazuki Matsunaga , Eiichi Matsumoto , Masahiro Ichihara
IPC: C23C14/04 , C23C14/24 , C23C16/04 , H01L51/56 , H01L51/00 , C23C14/56 , C23C16/44 , C23C14/54 , C23C14/12 , C23C16/50
CPC classification number: H01L51/0011 , C23C14/042 , C23C14/12 , C23C14/24 , C23C14/54 , C23C14/564 , C23C16/042 , C23C16/4412 , C23C16/50 , H01L51/001 , H01L51/0012 , H01L51/56 , H01L2227/323 , H01L2251/533
Abstract: The present invention relates to a vapor deposition device for forming a film on a substrate, including: a vapor deposition chamber; a vapor deposition unit including a vapor deposition mask provided with an opening for pattern formation; and a transport mechanism that is configured to transfer at least one of the substrate and the vapor deposition unit relative to the other in a first direction perpendicular to the normal direction of the vapor deposition mask and that is configured to cause the substrate to rest temporarily at a resting position relative to the vapor deposition unit. The substrate includes a vapor-deposition-target region, and the region does not overlap the opening of the vapor deposition mask when the substrate is at the resting position. The vapor deposition chamber is provided with a first vent and a second vent.
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公开(公告)号：US09845530B2
公开(公告)日：2017-12-19
申请号：US15310499
申请日：2015-05-07
Applicant: Sharp Kabushiki Kaisha
Inventor： Satoshi Inoue , Katsuhiro Kikuchi , Shinichi Kawato , Takashi Ochi , Yuhki Kobayashi , Kazuki Matsunaga , Eiichi Matsumoto , Masahiro Ichihara
CPC classification number: C23C16/042 , C23C14/04 , C23C14/042 , C23C14/24 , C23C14/56 , C23C16/52 , H01L51/50 , H01L51/56
Abstract: A mask for a vapor deposition apparatus includes an outer frame; a first bar disposed on an inner side of the outer frame and fixed to the outer frame; and a pattern forming portion disposed on the outer frame and the first bar and fixed to the outer frame. The pattern forming portion includes a plurality of mask openings for pattern formation. Each of the plurality of mask openings is disposed along a first direction. The plurality of mask openings are disposed in a second direction orthogonal to the first direction. The first bar is positioned between adjacent two mask openings among the plurality of mask openings when viewed along a third direction orthogonal to the first direction and the second direction, and is in contact with the pattern forming portion.
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公开(公告)号：US09373667B2
公开(公告)日：2016-06-21
申请号：US14764534
申请日：2014-01-29
Applicant: SHARP KABUSHIKI KAISHA
Inventor： Shinichi Kawato , Takashi Ochi , Yuhki Kobayashi , Masahiro Ichihara , Eiichi Matsumoto
CPC classification number: H01L27/3211 , C23C14/04 , C23C14/24 , H01L51/0008 , H01L51/001 , H01L51/0011 , H01L51/5012 , H01L51/56
Abstract: The present invention provides a display device which inhibits deterioration in display quality caused by color mixture of luminescent layers. In a case where vapor deposition particles are deposited onto a substrate, P+2Lc≧{(Ts×M+0.96×G×Wn)/(Ts−G)}+2Dm and 3 μm≦Dm ≦5 μm are satisfied, where “M” is a width of a mask opening, “Wn” is a width of an injection hole, “G” is a distance between the TFT substrate and a vapor deposition mask, “Ts” is a distance between the TFT substrate and a vapor deposition source, “P” is a width of a first pixel opening, and “Lc” is a width of a non-display region.
Abstract translation: 本发明提供一种抑制由发光层的混色引起的显示品质恶化的显示装置。 在将蒸镀粒子沉积在基板上的情况下，满足P +2Lc≥{（Ts×M + 0.96×G×Wn）/（Ts-G）} + 2Dm，3μm＆nlE; Dm＆nlE;5μm， 其中“M”是掩模开口的宽度，“Wn”是注入孔的宽度，“G”是TFT基板和蒸镀掩模之间的距离，“Ts”是TFT基板与 气相沉积源“P”是第一像素开口的宽度，“Lc”是非显示区域的宽度。
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