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公开(公告)号:US20250079126A1
公开(公告)日:2025-03-06
申请号:US18726294
申请日:2022-11-14
Applicant: Shibaura Machine Co., Ltd.
Inventor: Rintaro SUEKI , Kazuhiro FUKADA , Takeshi NAMBA
Abstract: A surface treatment apparatus (10) performs film formation on a surface of a workpiece (W) in a chamber (20), and includes: an HCD electrode (210) (electrode) that supplies reaction gas to the workpiece (W) or a sputtering electrode (220) (electrode) that releases target particles to the workpiece (W), the HCD electrode (210) or the sputtering electrode (220) being placed facing the workpiece (W); a gas supply pipe (90) that is installed along an outer periphery of the electrode and has, along a longitudinal direction of the pipe, a plurality of gas ejection ports (91) through which film-forming gas, or an inert gas or a reactive gas for performing sputtering is supplied to an electrode surface of the electrode; and an exhaust device (51) (gas discharge unit) that discharges residual gas after film formation is ended, and the plurality of gas ejection ports (91) are arranged such that gas supplied from the gas supply pipe (90) is uniformly distributed on the electrode surface of the electrode.
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公开(公告)号:US20250129464A1
公开(公告)日:2025-04-24
申请号:US18683873
申请日:2022-09-08
Applicant: Shibaura Machine Co., Ltd.
Inventor: Mitsunori KOKUBO , Satoshi FUKUYAMA , Kazuhiro FUKADA , Rintaro SUEKI , Yoshiaki KURIHARA , Takeshi NAMBA
Abstract: A surface treatment apparatus includes a housing unit that houses at least one workpiece, a placement device in which the workpiece is placed such that the workpiece is substantially orthogonal to a normal direction of an outer peripheral surface of a rotating shaft extending in a horizontal direction, and faces outward, a first rotating device that rotates the placement device) around the rotating shaft in a state where the placement device is housed in the housing unit, a surface treatment device that extends inside the housing unit and in parallel with the rotating shaft and performs surface treatment by supplying gas to a surface of the workpiece, and an exhaust device that is provided inside the housing unit at a position different from a position where the surface treatment device is provided, and adjusts pressure and exhausts gas inside the housing unit.
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