公开(公告)号：US5618749A

公开(公告)日：1997-04-08

申请号：US414761

申请日：1995-03-31

Applicant: Toshiyuki Takahashi ,  Shigeru Suga ,  Touhachi Makino

Inventor： Toshiyuki Takahashi ,  Shigeru Suga ,  Touhachi Makino

IPC: H01L27/04 ,  H01L21/02 ,  H01L21/822 ,  H01L21/8234 ,  H01L21/8238 ,  H01L27/06 ,  H01L27/092 ,  H01L21/70 ,  H01L27/00

CPC classification number: H01L28/20 ,  H01L27/0629 ,  H01L28/40 ,  Y10S148/014 ,  Y10S148/136

Abstract: A semiconductor integrated circuit including a MOSFET having a polycide gate structure, a resistor and a capacitor is monolithically manufactured. Polycrystalline silicon film, a dielectric film, and another polycrystalline silicon film are consecutively deposited. After processes of patterning and etching the dielectric film, the remaining dielectric films are used as an etching protection mask for the resistor and a capacitor. A refractory metal silicide for a polycide gate is uniformly deposited over the remaining another polycrystalline silicon films and dielectric films. The refractory metal silicide and polycrystalline silicon are consecutively etched through a patterned resist mask and the remaining dielectric films to simultaneously form the polycide gate, resistor and capacitor. Thus, a capacitor having small change in capacitance versus applied voltage is manufactured in a MOS IC device having a polycide gate.

Abstract translation: 包括具有多晶硅栅极结构的MOSFET的半导体集成电路，电阻器和电容器被单片地制造。 多晶硅膜，电介质膜和另一多晶硅膜连续沉积。 在对电介质膜进行图案化和蚀刻处理之后，剩余的电介质膜被用作电阻器和电容器的蚀刻保护掩模。 用于多晶硅栅极的难熔金属硅化物均匀地沉积在剩余的另一多晶硅膜和介电膜上。 难熔金属硅化物和多晶硅通过图案化的抗蚀剂掩模和剩余的电介质膜连续蚀刻，以同时形成多晶硅栅极，电阻器和电容器。 因此，在具有多晶硅栅极的MOS IC器件中制造了电容与施加电压的变化小的电容器。

公开(公告)号：US4232971A

公开(公告)日：1980-11-11

申请号：US23094

申请日：1979-03-22

Applicant: Shigeru Suga

Inventor： Shigeru Suga

IPC: G01J3/10 ,  G01N21/47 ,  G02B27/00 ,  G01J1/00

CPC classification number: G01N21/474

Abstract: An integrating sphere type standard light source has a spherical shell the inner surface of which is coated with a white coating having a high reflectivity. The shell has a light source aperture in the top thereof, a viewing aperture in the side thereof and a specimen exposure aperture in the bottom thereof. A light source is mounted in the light source aperture and depends into said shell and includes a source of light and a light shielding plate between the source of light and the remainder of the interior of the shell, the light shielding plate also being coated with a white coating having a high reflectivity. A specimen supporting plate is positioned beneath the specimen exposure aperture and is normally positioned for supporting a specimen at the bottommost point of an imaginary spherical surface which is an extension of the internal surface of the shell into the specimen exposure aperture. A specimen supporting plate is mounted for movement into and out of the normal position thereof for placing a specimen to be observed on the specimen supporting plate.

Abstract translation: 积分球型标准光源具有球面壳，其内表面涂覆有具有高反射率的白色涂层。 壳体在其顶部具有光源孔，在其侧面具有观察孔，并在其底部具有样本曝光孔。 光源安装在光源孔中并且依赖于所述外壳，并且包括光源和光源之间的遮光板和外壳的其余部分之间的遮光板，遮光板还涂覆有 具有高反射率的白色涂层。 试样支撑板位于试样暴露孔的下方，并且通常定位用于将试样支撑在假想球面的最底点处，该假想球面是壳体内表面延伸到试样暴露孔中。 安装样品支撑板，用于移动和移出其正常位置，以将要观察的样本放置在样本支撑板上。

公开(公告)号：US4196611A

公开(公告)日：1980-04-08

申请号：US971254

申请日：1978-12-18

Applicant: Shigeru Suga

Inventor： Shigeru Suga

IPC: G01N3/56

CPC classification number: G01N3/56

Abstract: A test apparatus for determining the abrasion resistance of the surface of a sample to be tested. The sample is placed with the surface to be tested facing downwardly through an aperture in a sample support, an abrasion wheel is positioned beneath the sample and urged upwardly against the sample, the sample is reciprocated horizontally back and forth over the abrasion wheel, and at the end of each reciprocal movement, the abrasion wheel is moved away from the sample and rotationally indexed.

Abstract translation: 一种用于测定待测样品表面的耐磨性的试验装置。 将样品放置成待测试的表面向下穿过样品支架的孔，磨轮位于样品下方并向上推靠在样品上，样品在磨轮上水平往复运动，并且在 每个往复运动的结束，磨轮被移动离开样品并旋转分度。

公开(公告)号：US4075529A

公开(公告)日：1978-02-21

申请号：US779225

申请日：1977-03-18

Applicant: Shigeru Suga

Inventor： Shigeru Suga

IPC: H01J1/50 ,  H01J61/26 ,  H01J61/16

CPC classification number: H01J1/50 ,  H01J61/26

Abstract: A xenon lamp containing magnet adsorbers, each of the magnet adsorbers having pieces of magnetic material which are dispersed in a ring-shaped, heat-resisting, electric insulating plate and being mounted between the discharge portion of an electrode inside the tube of the xenon lamp and the sealed portion of the electrode at an end of the tube, whereby the metallic vapor and other volatilized matters resulting from the elevated temperature of the electrode during discharge are adsorbed by the adsorber due to the magnetic field of the latter and do not adhere to the inside of the tube to thereby prevent blackening, devitrification and white-turbidity of the tube.

公开(公告)号：US4025440A

公开(公告)日：1977-05-24

申请号：US683216

申请日：1976-05-04

Applicant: Shigeru Suga

Inventor： Shigeru Suga

IPC: H05B41/392 ,  G01J1/32

CPC classification number: H05B41/392

Abstract: A temperature compensating device for use in regulating the voltage to a lamp in a lightfastness tester. The device includes a plurality of aluminum-coated glass rods adjacent the lamp for transmitting the light produced by the lamp to a light-receiving element, such as a photoelectric cell. A heat-sensitive resistance is electrically connected to the light-receiving element and compensates for changes in temperature of the light-receiving element. An electric circuit is combined with the light-receiving element and the resistance to receive the temperature adjusted voltage from the light-receiving element and the resistance and to compare that voltage with a reference voltage. In turn, the voltage to the xenon lamp is adjusted based on the difference between the two compared voltages.

Abstract translation: 一种温度补偿装置，用于调节耐光试验机中灯的电压。 该装置包括与灯相邻的多个铝涂覆的玻璃棒，用于将由灯产生的光传输到诸如光电池的光接收元件。 热敏电阻电连接到光接收元件并补偿光接收元件的温度变化。 电路与光接收元件和电阻接收来自光接收元件的温度调节电压和电阻，并将该电压与参考电压进行比较。 反过来，基于两个比较电压之间的差异来调节氙灯的电压。

公开(公告)号：US5698463A

公开(公告)日：1997-12-16

申请号：US654833

申请日：1996-05-29

Applicant: Shigeru Suga

Inventor： Shigeru Suga

IPC: H01L27/04 ,  H01L21/02 ,  H01L21/822 ,  H01L21/8234 ,  H01L27/06 ,  H01L21/70

CPC classification number: H01L28/40 ,  H01L27/0629

Abstract: On the principal surface of an Si semiconductor substrate, a field oxide film is formed defining an active region. On the active region, an insulated gate structure is formed including a gate oxide film and a polycrystalline Si layer. At the same time, a lower capacitor electrode of the polycrystalline Si layer is formed on the field oxide film. The surface of the polycrystalline layer is oxidized to form an insulating film. Another polycrystalline Si layer is deposited covering the insulating film. A mask is formed over the lower capacitor electrode. By using this mask as an etching mask, anisotropic etching is performed to leave an upper capacitor electrode and side wall spacers on the side walls of the gate electrode and lower capacitor electrode.

Abstract translation: 在Si半导体衬底的主表面上形成限定有源区的场氧化膜。 在有源区域上，形成包括栅极氧化膜和多晶硅层的绝缘栅极结构。 同时，在场氧化膜上形成多晶Si层的较低电容电极。 多晶层的表面被氧化形成绝缘膜。 另外沉积覆盖绝缘膜的多晶Si层。 在下电容器电极上形成掩模。 通过使用该掩模作为蚀刻掩模，进行各向异性蚀刻以在栅电极和下电容器电极的侧壁上留下上电容器电极和侧壁间隔物。

公开(公告)号：US5138892A

公开(公告)日：1992-08-18

申请号：US524049

申请日：1990-05-16

Applicant: Shigeru Suga

Inventor： Shigeru Suga

IPC: G01N17/00

CPC classification number: G01N17/004

Abstract: A method of carrying out an accelerated light fastness test on a sample of a material to be used under certain conditions of air convection along the surface thereof, is constituted by the steps of positioning a sample to be tested with the surface thereof which is exposed to light during intended conditions of use of the material spaced at a distance from a light source having a constant intensity of light radiated therefrom for causing the surface of the sample to receive a desired intensity of light, and positioning a filter between the surface of the sample and the light source and spaced a distance from the surface of the sample for causing air between the filter and the sample to be at the convection conditions corresponding to the certain conditions of air convection at the surface of the material under its intended conditions of use, whereby the temperature conditions of the material at the surface facing the source of light are made to correspond to the temperature conditions during the intended use of the material.

Abstract translation: 对沿着其表面的某些空气对流条件下使用的材料的样品进行加速耐光性试验的方法由以下步骤构成：将待测样品与其表面暴露于 在使用材料的期望条件下，在与具有从其辐射的光的恒定强度的光源隔开一段距离处的材料的光线处，以使样品的表面接收期望的强度的光，并将滤光片定位在样品的表面之间 和光源，并且与样品表面隔开一段距离，以使过滤器和样品之间的空气处于对应于在其预期使用条件下在材料表面处的空气对流的某些条件的对流条件， 由此使面向光源的表面上的材料的温度条件对应于温度条件 在材料的预期使用期间。

公开(公告)号：US4954693A

公开(公告)日：1990-09-04

申请号：US378293

申请日：1989-07-11

Applicant: Kenhachi Mitsuhashi ,  Shigeru Suga

Inventor： Kenhachi Mitsuhashi ,  Shigeru Suga

IPC: F27B17/00 ,  F27B17/02 ,  F27D7/06 ,  F27D19/00

CPC classification number: F27B17/0083 ,  F27D19/00 ,  F27B17/02 ,  F27D2019/0009 ,  F27D2019/0018 ,  F27D7/06

Abstract: A ventilation regulated hot air supplied constant temperature oven used for heat aging testing. Heated air of a predetermined temperature is supplied to a test oven body through an air supply port. Ventilation of the test oven is carried out through the air discharge port at a predetermined rate at predetermined time intervals. A discharge cylinder is provided at the discharge port, a blower is connected to the air supply port, a differential pressure detector is connected to the discharge cylinder and adapted to detect a differential pressure corresponding to the air flow rate on the basis of the data obtained in advance on the relation between a difference between the pressure at an outlet port of the blower and that at the discharge cylinder and the air flow rate, and a blower speed regulator is provided between the blower and the differential pressure detector and adapted to control the speed of the blower in accordance with an output level of a signal corresponding to a differential pressure measured by the differential pressure detector.

Abstract translation: 通风调节热风供应恒温烤箱用于热老化测试。 预定温度的加热空气通过供气口供给到试验箱本体。 试验炉的通风以预定的速率以预定的时间间隔通过排气口进行。 在排出口设有排气筒，鼓风机连接到供气口，差压检测器连接到排气缸，适合于根据获得的数据检测与空气流量对应的差压 在鼓风机和差压检测器之间，提供鼓风机和差压检测器之间的关系，鼓风机和差压检测器之间的关系，鼓风机和差压检测器之间的关系，鼓风机速度调节器之间的关系， 根据与差压检测器测得的压差对应的信号的输出电平，鼓风机的转速。

公开(公告)号：US4866003A

公开(公告)日：1989-09-12

申请号：US123566

申请日：1987-11-20

Applicant: Katsuyuki Yokoi ,  Shigeru Suga ,  Toshio Fujioka

Inventor： Katsuyuki Yokoi ,  Shigeru Suga ,  Toshio Fujioka

IPC: H01L21/318 ,  H01L23/29 ,  H01L23/31 ,  H01L29/78

CPC classification number: H01L21/3185 ,  H01L23/291 ,  H01L23/3171 ,  H01L2924/0002 ,  Y10S148/114 ,  Y10S438/958

Abstract: For enhancement of device stability, there is disclosed a semiconductor device fabricated on a semiconductor substrate comprising (a) source and drain regions formed in a surface portion of the semiconductor substrate and spaced from each other by a channel region, (b) a gate insulating film formed on the channel region, (c) a gate electrode structure formed on the gate insulating film, and (d) a passivation film of an insulating material covering the gate electrode structure and containing hydrogen-bonded-silicons equal in number to or less than 5.times.10.sup.21 per cm.sup.3, and the unstable hydrogen-bonded-silicons are decreased in number so that the semiconductor device only have a decreased trap density which results in stable operation.

Abstract translation: 为了提高器件的稳定性，公开了一种在半导体衬底上制造的半导体器件，包括：（a）源极和漏极区域，形成在半导体衬底的表面部分中并且通过沟道区彼此间隔开，（b）栅极绝缘 形成在沟道区上的膜，（c）形成在栅极绝缘膜上的栅电极结构，以及（d）覆盖栅电极结构并且含有等于或少于等于或等于或等于数个的氢键的硅的绝缘材料的钝化膜 超过5×10 21 / cm 3，并且不稳定的氢键合硅的数量减少，使得半导体器件仅具有降低的陷阱密度，这导致稳定的操作。

公开(公告)号：US4613235A

公开(公告)日：1986-09-23

申请号：US701193

申请日：1985-02-13

Applicant: Shigeru Suga

Inventor： Shigeru Suga

IPC: G01N21/57 ,  G01N21/47

CPC classification number: G01N21/57

Abstract: A method and apparatus for measuring the gloss of a surface of a material by receiving light reflected from the surface and measuring the amount of light. Parallel light rays from a light source are directed against the surface the gloss of which is to be determined at an angle of incidence, and a cross-section of light rays reflected from the surface at an angle of reflection equal to the angle of incidence is received and the central region of the cross-section of the light rays is blocked out by a light intercepting plate, so that only the light received after the blocking out of the central region is used as a determination of the gloss of the surface.

Abstract translation: 一种用于通过接收从表面反射的光并测量光量来测量材料表面的光泽的方法和装置。 来自光源的平行光线被引导到其光泽被以入射角确定的表面，并且以与入射角相等的反射角从表面反射的光线的横截面是 并且光线的横截面的中心区域被遮光板遮挡，使得仅在从中心区域阻挡之后接收到的光被用作确定表面的光泽度。