摘要:
A pattern-matching sewing machine that constantly samples photo-intensity data during calculation of a mismatch distance and during adjustment of the feeding mechanism based on the calculated mismatch distance. When the adjustment is finished, a new mismatch-distance calculation is quickly started, not by waiting for sampling new photo-intensity data of a predetermined number, but by using photo-intensity data of the predetermined number including the data thus sampled during the previous calculation and adjustment, and the previously stored data which have been used in the previous calculation.
摘要:
A pattern-matching sewing machine for sewing two sheets, (e.g. two cloths) having the same patterns with their patterns matching. The sewing machine has a plurality of mismatch calculation modes. The operator selects one of the calculation modes appropriate to the type or characteristics of the pattern to be sewn and the mismatch distance is calculated according to the selected mode.
摘要:
A pattern matching sewing machine comprises a sewing means for sewing two superposed sheets of cloth having substantially identical patterns thereon, a feeding means for feeding the two cloth sheets into the sewing means, a detecting means for detecting a mismatch distance between the patterns on the two cloth sheets, and a transport means to transport the two cloth sheets relatively. The pattern displacement amount detected by the pattern mismatch distance amount detecting means may be reduced. A determining means is provided for determining whether pattern matching is possible or not based on the information relating to the mismatch distance obtained by the detecting means.
摘要:
A pattern-matching sewing machine having a feed-correcting means for accurately adjusting feed amount using a correction factor with three values which are set according to various sewing conditions such as species of cloths and a speed of a main motor. When the feed amount for pattern matching is calculated based on only a mismatch distance detected by a photo-sensor, the accurate pattern matching is not achieved due to the various sewing conditions. Therefore, the feed-correcting means selects the optimum one of the three values to accurately correct the feed amount for a good pattern matching.
摘要:
A sewing machine for sewing two overlapped cloth pieces including sensor means for detecting the intensity of light transmitted through each respective cloth piece, intensity curve generating means for generating respective intensity curves over a predetermined distance, differentiation means for differentiating between the intensity curves of each cloth piece and for generating differential curves for each cloth piece, difference determining means for determining a displacement between the two differential curves and feed pitch control means for adjusting a feed pitch based on the displacement. The sewing machine of the invention matches and sews the two cloth pieces having the same lateral and vertical patterns by ignoring the detected vertical pattern data having unclear and vague broad peaks and using the detected lateral pattern data having clear sharp peaks to have the two cloth pieces' patterns matched in alignment.
摘要:
A fabric position correcting device detects the position of at least one of an outer profile line and a pattern of a fabric portion corresponding to one of pressers, corrects the position of the fabric portion while holding the same whose position has been detected, and presses the fabric portion with the presser after the position thereof has been corrected. The aligning process composed of the above three steps is carried out four times successively with respect to fabric portions corresponding to the respective pressers from the leading end of the fabric in the direction in which it is fed. Then, the positionally corrected fabrics are fed to the sewing start position. Therefore, the positional correction of the fabrics relative to at least one of the outer profile line and the pattern thereof can be accurately, reliably, and automatically carried out from the leading end to trailing end of the fabrics.
摘要:
A processing device for processing a sheet material with a pattern of the present invention is such as a sewing machine with pattern matching operation. The processing device has a detecting unit for detecting a color state of the pattern of the sheet material and producing a color state signal indicative of the color state. The processing device processes the sheet material on the basis of the color state signal produced by said detecting means. According to the present invention, the processing device is provided with an automatic adjusting unit for adjusting the detecting unit to allow the detecting unit to produce a desired color state signal with respect to a reference color state. Therefore, the white balance or the dynamic range is properly adjusted simply and reliably for the processing device.
摘要:
A fabric position correcting device for correcting relative position of two fabrics in terms of alignment in at least one of outer profile lines and patterns of the fabrics. A pair of fabric holders are provided which respectively hold first and second fabrics. The holders are movable in X, Y directions, and angularly rotatable about a vertical axis for moving the respective fabrics. A pair of image sensors are provided for picking up at least one of outer profiles and patterns of the respective fabrics. Data from the image sensors are utilized for computation of moving distance and angular rotation angle of the holders in order to eliminate misalignment between two fabrics in terms of at least one of the profiles and patterns.
摘要:
According to one embodiment, audio controlling apparatus includes first receiver configured to receive audio signal, second receiver configured to receive environmental sound, masking gain calculator configured to calculate masking gain for each frequency band, based on audio signal and environmental sound, and gain controller configured to smooth masking gain of frequency band that is less than preset threshold frequency in first interval, smooth masking gain of frequency band that is equal to or higher than threshold frequency in second interval that is longer than first interval, and thereby set gain.
摘要:
According to one embodiment, a sound quality control device includes: a time domain analysis module configured to perform a time-domain analysis on an audio-input signal; a frequency domain analysis module configured to perform a frequency-domain analysis on a frequency-domain signal; a first calculation module configured to calculate first speech/music scores based on the analysis results; a compensation filtering processing module configured to generate a filtered signal; a second calculation module configured to calculate second speech/music scores based on the filtered signal; a score correction module configured to generate one of corrected speech/music scores based on a difference between the first speech/music score and the second speech/music score; and a sound quality control module configured to control a sound quality of the audio-input signal based on the one of the corrected speech/music scores.