公开(公告)号：US5579850A

公开(公告)日：1996-12-03

申请号：US321997

申请日：1994-10-12

申请人： Shigetoshi Kimura ,  Masami Onodera ,  Yoshinori Takahashi

发明人： Shigetoshi Kimura ,  Masami Onodera ,  Yoshinori Takahashi

IPC分类号： A01B63/111

CPC分类号： A01B63/1117

摘要： A cultivating system including a tractor, a cultivating machine for performing a cultivating work in combination with the tractor, and a link mechanism for linking the tractor and the cultivating machine, includes a free-motion mechanism provided to at least one of the tractor, the cultivating machine and the link mechanism, and having a free motion permissible zone in which at least one of the tractor, the cultivating machine and the link mechanism is freely movable relatively to the others in accordance with variation of a cultivation attitude of the cultivating machine due to variation of a cultivation environment, a cultivation-condition control mechanism for detecting the free motion of at least one of the tractor, the cultivating machine and the link mechanism within the free motion permissible zone in accordance with the variation of the cultivation environment, and moving the cultivating machine in accordance with the free motion permissible zone so as to offset the variation of the attitude of said cultivating machine due to the variation of the cultivation environment, whereby the cultivating machine performs its cultivating work in a desired invariable cultivation condition, and a free-motion transmitting mechanism for transmitting the free motion in the free motion permissible zone to the cultivation-condition control mechanism.

摘要翻译： 一种栽培系统，包括拖拉机，用于与拖拉机结合进行耕作的栽培机，以及用于连接牵引机和栽培机的连杆机构，包括：自动运动机构，其设置在至少一个拖拉机， 栽培机和连杆机构，并且具有自由运动允许区域，其中拖拉机，耕作机和连杆机构中的至少一个可根据培养机器的栽培姿态的变化相对于其他自由运动 栽培环境的变化，用于根据栽培环境的变化来检测自由运动允许区域内的至少一个拖拉机，栽培机和连杆机构的自由运动的栽培条件控制机构，以及 根据自由运动允许区域移动耕作机，以抵消变化o f是由于培养环境的变化而导致的栽培机的姿态，由此培养机以期望的不变栽培条件进行栽培工作;以及自由运动传递机构，用于将自由运动允许区域中的自由运动传递到 栽培条件控制机制。

公开(公告)号：US5140774A

公开(公告)日：1992-08-25

申请号：US785974

申请日：1991-10-31

申请人： Masami Onodera

发明人： Masami Onodera

IPC分类号： B24B7/04 ,  B24B27/00 ,  B24B37/34

CPC分类号： B24B37/345 ,  B24B27/0069 ,  B24B7/04

摘要： An apparatus capable of simultaneously polishing a plurality of hard disk substrates at the same time includes at least three substrate carriers which are rotatably disposed on an index table and which carry and transfer a plurality of hard disk substrates, are moved successively through a substrate loading station, a substrate polishing station and a substrate removing station in response to intermittent rotation of the index table.

摘要翻译： 同时能够同时对多个硬盘基板进行同时研磨的装置包括至少三个可旋转地设置在分度台上并承载并传送多个硬盘基板的基板载体，依次通过基板装载站 ，基板抛光台和基板去除台，响应于分度台的间歇旋转。

公开(公告)号：US5685040A

公开(公告)日：1997-11-11

申请号：US141714

申请日：1993-10-26

申请人： Masami Onodera

发明人： Masami Onodera

IPC分类号： B08B1/04 ,  B08B11/02 ,  G11B23/50 ,  H01L21/00

CPC分类号： H01L21/67028 ,  B08B1/04 ,  B08B11/02 ,  G11B23/505

摘要： An apparatus for cleaning and then drying batches of hard disk substrates includes a substrate cleaning station and a substrate drying station. The substrate cleaning station includes a first index table supporting thereon at least three circumferentially spaced first substrate carriers on which hard disk substrates are mounted respectively. The substrate drying station includes a second index table disposed rearward of the first index table and supporting thereon at least three circumferentially spaced second substrate carriers on which cleaned hard disk substrate are mounted, respectively. Upon rotation of the first index table, each of the first substrate carriers moves successively through a substrate mounting position, a substrate cleaning position and a substrate removing position. Likewise, upon rotation of the second index table, each of the second substrate carriers moves through a substrate mounting position, a substrate drying position and a substrate removing position. Thus, a series of hard disk substrates supplied to the substrate cleaning station are cleaned at the substrate cleaning station and then dried at the substrate drying station, and after than the dried substrates are removed in succession from the substrate drying station.

摘要翻译： 用于清洗和干燥多个硬盘基片的装置包括基片清洗台和基片干燥台。 基板清洗台包括：第一分度台，其在其上支撑有至少三个周向间隔开的第一基板载体，硬盘基板分别安装在第一基板载体上。 基板干燥站包括设置在第一分度台后面的第二分度台，并在其上分别支撑有至少三个周向间隔开的第二基板载体，其上分别安装有清洁的硬盘基板。 在第一分度台旋转时，第一基板载体中的每一个依次移动通过基板安装位置，基板清洁位置和基板去除位置。 类似地，在第二分度表旋转时，每个第二基板载体移动通过基板安装位置，基板干燥位置和基板去除位置。 因此，提供给基板清洗站的一系列硬盘基板在基板清洗站处被清洗，然后在基板干燥站处干燥，并且比干燥的基板从基板干燥站连续地被除去。

公开(公告)号：US5357645A

公开(公告)日：1994-10-25

申请号：US61107

申请日：1993-05-14

申请人： Masami Onodera

发明人： Masami Onodera

IPC分类号： B08B1/04 ,  B08B11/02 ,  G11B23/50

CPC分类号： G11B23/505 ,  B08B1/04 ,  B08B11/02 ,  Y10S134/902

摘要： An apparatus for cleaning and then drying batches of hard disk substrates includes a substrate cleaning station and a substrate drying station. The substrate cleaning station includes a first index table supporting thereon at least three circumferentially spaced first substrate carriers on which hard disk substrates are mounted respectively. The substrate drying station includes a second index table disposed rearward of the first index table and supporting thereon at least three circumferentially spaced second substrate carriers on which cleaned hard disk substrates are mounted, respectively. Upon rotation of the first index table, each of the first substrate carriers moves successively through a substrate mounting position, a substrate cleaning position and a substrate removing position. Likewise, upon rotation of the second index table, each of the second substrate carriers moves through a substrate mounting position, a substrate drying position and a substrate removing position. Thus, a series of hard disk substrates suppled to the substrate cleaning station are cleaned at the substrate cleaning station, and after that the dried substrates are removed in succession from the substrate drying station.

摘要翻译： 用于清洗和干燥多个硬盘基片的装置包括基片清洗台和基片干燥台。 基板清洗台包括：第一分度台，其在其上支撑有至少三个周向间隔开的第一基板载体，硬盘基板分别安装在第一基板载体上。 基板干燥站包括设置在第一分度台后面的第二分度台，并在其上分别支撑至少三个周向间隔开的第二基板载体，其上安装有清洁的硬盘基板。 在第一分度台旋转时，第一基板载体中的每一个依次移动通过基板安装位置，基板清洁位置和基板去除位置。 类似地，在第二分度表旋转时，每个第二基板载体移动通过基板安装位置，基板干燥位置和基板去除位置。 因此，在基板清洗台处清洁提供给基板清洗台的一系列硬盘基板，然后从基板干燥台连续地除去干燥的基板。

公开(公告)号：US5875505A

公开(公告)日：1999-03-02

申请号：US917829

申请日：1997-08-27

申请人： Masami Onodera

发明人： Masami Onodera

IPC分类号： B08B1/04 ,  B08B11/02 ,  G11B23/50 ,  H01L21/00

CPC分类号： H01L21/67028 ,  B08B1/04 ,  B08B11/02 ,  G11B23/505

摘要： A substrate cleaning station includes a first index table supporting thereon at least three circumferentially spaced first substrate carriers on which hard disk substrates are mounted respectively. A substrate drying station includes a second index table disposed rearward of the first index table and supporting thereon at least three circumferentially spaced second substrate carriers on which cleaned hard disk substrate are mounted, respectively. Upon rotation of the first index table, each of the first substrate carriers moves successively through a substrate mounting position, a substrate cleaning position and a substrate removing position. Likewise, upon rotation of the second index table, each of the second substrate carriers moves through a substrate mounting position, a substrate drying position and a substrate removing position.

摘要翻译： 基板清洗台包括：第一分度台，其上分别支撑有至少三个周向间隔开的第一基板载体，硬盘基板分别安装在第一基板载体上。 基板干燥站包括设置在第一分度台后面的第二分度台，并在其上分别支撑至少三个周向间隔开的第二基板载体，其上分别安装有清洁的硬盘基板。 在第一分度台旋转时，第一基板载体中的每一个依次移动通过基板安装位置，基板清洁位置和基板去除位置。 类似地，在第二分度表旋转时，每个第二基板载体移动通过基板安装位置，基板干燥位置和基板去除位置。

公开(公告)号：US5538460A

公开(公告)日：1996-07-23

申请号：US363042

申请日：1994-12-23

申请人： Masami Onodera

发明人： Masami Onodera

IPC分类号： B24B7/22 ,  B24B53/02 ,  B24B7/00 ,  B24B9/00

CPC分类号： B24B7/228 ,  B24B53/02

摘要： An apparatus for grinding hard disk substrates includes a dressing unit essentially radially movable across the faces of rotating of grinding wheels for simultaneously dressing one or both of the two confronting surfaces thereof. The apparatus thus constructed is suited to fully automated grinding/dressing operations.

摘要翻译： 用于研磨硬盘基板的装置包括修整单元，其基本上可径向移动跨越砂轮的旋转面，以同时修整其两个相对表面中的一个或两个。 如此构造的装置适合于全自动研磨/修整操作。