公开(公告)号：US20240345480A1

公开(公告)日：2024-10-17

申请号：US18625950

申请日：2024-04-03

申请人： Shin-Etsu Chemical Co., Ltd.

发明人： Masaki Ohashi ,  Shun Kikuchi ,  Seiichiro Tachibana ,  Ryunosuke Handa

IPC分类号： G03F7/029 ,  G03F7/32

CPC分类号： G03F7/029 ,  G03F7/325

摘要： The negative-tone molecular resist composition comprises an onium salt containing a cation having a cyclic ether site and an organic solvent has a high sensitivity and forms a resist film with improved resolution and LWR when processed by photolithography using high-energy radiation. The molecular resist composition of the invention meets both high sensitivity and high resolution and is improved in LWR when processed by photolithography using high-energy radiation, especially EB or EUV lithography. The resist composition is quite useful for precise micropatterning.

公开(公告)号：US20240272550A1

公开(公告)日：2024-08-15

申请号：US18539887

申请日：2023-12-14

申请人： Shin-Etsu Chemical Co., Ltd.

发明人： Masaki Ohashi ,  Seiichiro Tachibana ,  Shun Kikuchi ,  Ryunosuke Handa

IPC分类号： G03F7/029 ,  G03F7/004 ,  G03F7/039 ,  G03F7/32

CPC分类号： G03F7/0295 ,  G03F7/0048 ,  G03F7/039 ,  G03F7/322

摘要： A resist composition is provided that comprises a hypervalent iodine compound having the formula (1), a carboxy group-containing polymer, and a solvent. In formula (1), n is an integer of 0 to 5, R1 and R2 are each independently halogen or a C1-C10 hydrocarbyl group which may contain a heteroatom, R1 and R2 may bond together to form a ring with the carbon atoms to which they are attached and the intervenient atoms. R3 is halogen or a C1-C40 hydrocarbyl group which may contain a heteroatom.